Method and apparatus for optical coating in wafer fabrication reactors

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	Method and apparatus for optical coating in wafer fabrication reactors
其他题名	Method and apparatus for optical coating in wafer fabrication reactors
	LIXIANG, JIN; CHEN, JIANYU MARTIN; LIM, HWI SIONG; VICTOR TEO, KIAN HIN; LAM, YEE LOY
	2003-10-02
专利权人	DENSELIGHT SEMICONDUCTORS PTE LTD
公开日期	2003-10-02
授权国家	美国
专利类型	发明申请
摘要	A method and a carrier frame for coating the facets of semiconductor devices, in which a plurality of bars are stacked so as to form a wafer such that the facets to be coated are exposed. The exposed facets may then be simultaneously coated in a wafer fabrication/deposition reactor to realise the associated time and cost benefits. The carrier comprises a suitable means for containing a plurality of bars and resiliently biased holding means for holding the bars in the stacked position.
其他摘要	一种用于涂覆半导体器件的刻面的方法和载体框架，其中堆叠多个条以形成晶片，使得待涂覆的刻面暴露。然后可以在晶片制造/沉积反应器中同时涂覆暴露的小平面，以实现相关的时间和成本效益。载体包括合适的装置，用于容纳多个杆和弹性偏置的保持装置，用于将杆保持在堆叠位置。
主权项	A carrier for bars of semiconductor devices to be coated with a coating comprising: means for containing a plurality of bars stacked such that the facets to be coated are exposed; and resiliently biased holding means for holding the bars in the stacked position.
申请日期	2003-03-18
专利号	US20030185963A1
专利状态	失效
申请号	US10/390808
公开（公告）号	US20030185963A1
IPC 分类号	H01S5/028 \| A61B5/103
专利代理人	-
代理机构	-
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/60941
专题	半导体激光器专利数据库
作者单位	DENSELIGHT SEMICONDUCTORS PTE LTD
推荐引用方式 GB/T 7714	LIXIANG, JIN,CHEN, JIANYU MARTIN,LIM, HWI SIONG,et al. Method and apparatus for optical coating in wafer fabrication reactors. US20030185963A1[P]. 2003-10-02.