OPT OpenIR

浏览/检索结果: 共3条,第1-3条 帮助

已选(0)清除 条数/页:   排序方式:
Gallium nitride-based semiconductor optical device, method of fabricating gallium nitride-based semiconductor optical device, and epitaxial wafer 专利
专利类型: 授权发明, 专利号: US8228963, 申请日期: 2012-07-24, 公开日期: 2012-07-24
发明人:  ENYA, YOHEI;  YOSHIZUMI, YUSUKE;  OSADA, HIDEKI;  ISHIBASHI, KEIJI;  AKITA, KATSUSHI;  UENO, MASAKI
Adobe PDF(354Kb)  |  收藏  |  浏览/下载:56/0  |  提交时间:2019/12/26
Compound semiconductor substrate, semiconductor device, and processes for producing them 专利
专利类型: 授权发明, 专利号: US7863609, 申请日期: 2011-01-04, 公开日期: 2011-01-04
发明人:  ISHIBASHI, KEIJI;  NAKANISHI, FUMITAKE
Adobe PDF(1956Kb)  |  收藏  |  浏览/下载:44/0  |  提交时间:2019/12/24
Manufacturing method of group III nitride substrate, group III nitride substrate, group III nitride substrate with epitaxial layer, manufacturing method of group III nitride substrate with epitaxial layer, and manufacturing method of group III nitride device 专利
专利类型: 发明申请, 专利号: US20080057608A1, 公开日期: 2008-03-06
发明人:  ISHIBASHI, KEIJI;  IRIKURA, MASATO;  NAKAHATA, SEIJI
收藏  |  浏览/下载:47/0  |  提交时间:2019/12/26