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Ultrafast Optomechanical Strain in Layered GeS
Luo, Duan1,2,3,4; Zhang, Baiyu5; Sie, Edbert J.4,6; Nyby, Clara M.7; Fan, Qingyuan1,4; Shen, Xiaozhe2; Reid, Alexander H.2; Hoffmann, Matthias C.2; Weathersby, Stephen2; Wen, Jianguo8; Qian, Xiaofeng5; Wang, Xijie2; Lindenberg, Aaron M.1,9,10
作者部门条纹相机工程中心
发表期刊NANO LETTERS
ISSN1530-6984;1530-6992
产权排序1
摘要

Strong coupling between light and mechanical strain forms the foundation for next-generation optical micro-and nano-electromechanical systems. Such optomechanical responses in two-dimensional materials present novel types of functionalities arising from the weak van der Waals bond between atomic layers. Here, by using structure-sensitive megaelectronvolt ultrafast electron dif-fraction, we report the experimental observation of optically driven ultrafast in-plane strain in the layered group IV monochalcogenide germanium sulfide (GeS). Surprisingly, the photoinduced structural deformation exhibits strain amplitudes of order 0.1% with a 10 ps fast response time and a significant in-plane anisotropy between zigzag and armchair crystallographic directions. Rather than arising due to heating, experimental and theoretical investigations suggest deformation potentials caused by electronic density redistribution and converse piezoelectric effects generated by photoinduced electric fields are the dominant contributors to the observed dynamic anisotropic strains. Our observations define new avenues for ultrafast optomechanical control and strain engineering within functional devices.

关键词optomechanical coupling 2D materials strain engineering photostrictive effect ultrafast electron diffraction
DOI10.1021/acs.nanolett.2c05048
收录类别SCI
语种英语
WOS记录号WOS:000953135100001
出版者AMER CHEMICAL SOC
引用统计
被引频次:3[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.opt.ac.cn/handle/181661/96415
专题条纹相机工程中心
通讯作者Lindenberg, Aaron M.
作者单位1.Stanford Univ, Dept Mat Sci & Engn, Stanford, CA 94305 USA
2.SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA
3.Chinese Acad Sci, Xian Inst Opt & Precis Mech, Key Lab Ultrafast Photoelect Diagnost Technol, Xian 710119, Peoples R China
4.Stanford Inst Mat & Energy Sci, SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA
5.Texas A&M Univ, Dept Mat Sci & Engn, College Stn, TX 77843 USA
6.Stanford Univ, Geballe Lab Adv Mat, Stanford, CA 94305 USA
7.Stanford Univ, Dept Chem, Stanford, CA 94305 USA
8.Argonne Natl Lab, Ctr Nanoscale Mat, Lemont, IL 60439 USA
9.Stanford Inst Mat & Energy Sci, Menlo Pk, CA 94025 USA
10.Stanford PULSE Inst, SLAC Natl Accelerator Lab, Menlo Pk, CA 94025 USA
推荐引用方式
GB/T 7714
Luo, Duan,Zhang, Baiyu,Sie, Edbert J.,et al. Ultrafast Optomechanical Strain in Layered GeS[J]. NANO LETTERS.
APA Luo, Duan.,Zhang, Baiyu.,Sie, Edbert J..,Nyby, Clara M..,Fan, Qingyuan.,...&Lindenberg, Aaron M..
MLA Luo, Duan,et al."Ultrafast Optomechanical Strain in Layered GeS".NANO LETTERS
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