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Study of Temperature Effects on the Design of Active Region for 808 nm High-Power Semiconductor Laser
Wu, Shunhua1,2; Li, Te1; Wang, Zhenfu1; Chen, Lang1; Zhang, Jiachen1; Zhang, Junyue1,2; Liu, Jiachen1,2; Zhang, Yeqi1,2; Deng, Liting1,2
作者部门瞬态光学研究室
2023-01
发表期刊CRYSTALS
ISSN2073-4352
卷号13期号:1
产权排序1
摘要

High-power, broad-area, semiconductor lasers are attractive sources for material processing, aerospace, and laser pumping. The design of the active region is crucial to achieve the required high power and electro-optical conversion efficiency, since the temperature significantly affects the performance of the quantum well, including the internal quantum efficiency and mode gain. In this work, the temperature effects on the active region of a 808 nm high-power semiconductor laser were investigated theoretically and experimentally. The simulations were performed with a Quasi-3D model, which involved complete steady-state semiconductor and carrier confinement efficiency combined with a new mathematical method. The critical aluminum content of the quantum barrier was proposed and the relationship between temperature and various loss sources was disclosed in the temperature range of 213 to 333 K, which provides a reliable reference for the design of epitaxial structures of high-power semiconductor lasers in different operating conditions. Subsequently, the optimized epitaxial structure was determined and used to fabricate standard laser bar chips with a cavity length of 2 mm. The experimental electro-optical conversion efficiency of 71% was demonstrated with a slope efficiency of 1.34 W/A and an injection current of 600 A at the heatsink temperature of 223 K. A record high electro-optical conversion efficiency of 73.5% was reached at the injection current of 400 A, while the carrier confinement efficiency was as high as 98%.

关键词semiconductor laser temperature effects carrier confinement internal quantum efficiency
DOI10.3390/cryst13010085
收录类别SCI
语种英语
WOS记录号WOS:000917044700001
出版者MDPI
引用统计
被引频次:1[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.opt.ac.cn/handle/181661/96316
专题瞬态光学研究室
通讯作者Li, Te
作者单位1.Chinese Acad Sci, Xian Inst Opt & Precis Mech, State Key Lab Transient Opt & Photon, Xian 710119, Peoples R China
2.Univ Chinese Acad Sci, Beijing 100049, Peoples R China
推荐引用方式
GB/T 7714
Wu, Shunhua,Li, Te,Wang, Zhenfu,et al. Study of Temperature Effects on the Design of Active Region for 808 nm High-Power Semiconductor Laser[J]. CRYSTALS,2023,13(1).
APA Wu, Shunhua.,Li, Te.,Wang, Zhenfu.,Chen, Lang.,Zhang, Jiachen.,...&Deng, Liting.(2023).Study of Temperature Effects on the Design of Active Region for 808 nm High-Power Semiconductor Laser.CRYSTALS,13(1).
MLA Wu, Shunhua,et al."Study of Temperature Effects on the Design of Active Region for 808 nm High-Power Semiconductor Laser".CRYSTALS 13.1(2023).
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