Xi'an Institute of Optics and Precision Mechanics,CAS
Semiconductor laser device | |
其他题名 | Semiconductor laser device |
TAMURA HIDEO; KURIHARA HARUKI; SAGARA MINORU; MATSUMOTO KENJI | |
1984-11-13 | |
专利权人 | TOSHIBA KK |
公开日期 | 1984-11-13 |
授权国家 | 日本 |
专利类型 | 发明申请 |
摘要 | PURPOSE:To suppress the deformation of the groove shape formed on the substrate to the utmost without causing a growth failure at crystal growth by arranging AlxGa1-xAs (0.1<=x<=1) layers which function only as deformation-preventing layers at least at two positions, upper and lowr positions within an n- GaAs layer as a current blocking layer. CONSTITUTION:On a p-GaAs substrate 20, a deformation preventing layer 21 consisting of n-Al0.4Ga0.6As, a current blocking layer 22 of n-GaAs, a deformation preventing layer 23 of n-Al0.4Ga0.6As and a cap layer 24 of n-GaAs are successively crystal-grown to 0.05mum, 0.6mum, 0.05mum and 0.05mum thick respectively. After that, a groove 25 is formed so as to reach the substrate 20. On that substrate, a p-Al0.45Ga0.55As first clad layer 26, a Ga0.9Al0.1As active layer 27, an n-Al0.45Ga0.55As second clad layer 28 and an n-GaAs ohmic layer 29 are successively crystal-grown, on which electrodes 30 and 31 are formed. In this constitution, a width of the groove (w) is limitted by the deformation preventing layer 23 and a current contructive width (u) is limitted by the deformation preventing layer 2 Consequently, the shape of the groove is hardly deformed and the optical characteristics nearly as desired in the design can be obtained. |
其他摘要 | 用途:通过排列AlxGa1-xAs(0.1 <= x <= 1)层至少起到防止变形层的作用,最大限度地抑制在基板上形成的沟槽形状的变形,而不会在晶体生长中造成生长失败在两个位置,n-GaAs层内的上部和下部位置作为电流阻挡层。组成:在p-GaAs衬底20上,由n-Al0.4Ga0.6As组成的变形防止层21,n-GaAs的电流阻挡层22,n-Al0.4Ga0.6As的变形防止层23和a n-GaAs的盖层24依次晶体生长到0.05μm,0.6μm,0.05μm和0.05μm厚。之后,形成凹槽25以便到达基板20.在该基板上,形成p-Al 0.45 Ga 0.55 As第一包层26,Ga0.9Al0.1As有源层27,n-Al0.45Ga0。在第二包层28和n-GaAs欧姆层29上依次进行晶体生长,在其上形成电极30和31。在这种结构中,沟槽(w)的宽度受到变形防止层23的限制,并且电流构造宽度(u)受到变形防止层21的限制。因此,沟槽的形状几乎不变形和光学可以获得几乎与设计中所需的特性。 |
申请日期 | 1983-04-27 |
专利号 | JP1984200483A |
专利状态 | 失效 |
申请号 | JP1983072934 |
公开(公告)号 | JP1984200483A |
IPC 分类号 | H01S5/00 | H01S5/223 | H01S5/24 | H01S5/32 | H01S5/323 | H01S3/18 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/86476 |
专题 | 半导体激光器专利数据库 |
作者单位 | TOSHIBA KK |
推荐引用方式 GB/T 7714 | TAMURA HIDEO,KURIHARA HARUKI,SAGARA MINORU,et al. Semiconductor laser device. JP1984200483A[P]. 1984-11-13. |
条目包含的文件 | ||||||
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JP1984200483A.PDF(161KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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