Xi'an Institute of Optics and Precision Mechanics,CAS
Semiconductor light emitting element | |
其他题名 | Semiconductor light emitting element |
HOSODA MASAHIRO; HAYASHI HIROSHI; YAMAMOTO SABURO; YANO MORICHIKA | |
1987-05-08 | |
专利权人 | SHARP CORP |
公开日期 | 1987-05-08 |
授权国家 | 日本 |
专利类型 | 发明申请 |
摘要 | PURPOSE:To improve the crystalline property of an excitation part, and increase the reliability of a semiconductor light emitting element, by controlling the generation location of defect in a compound semiconductor layer. CONSTITUTION:On a (100) P-type gallium . arsenic (GaAs) substrate 1, an inverse mesa type protrusion is formed, and then an internal current construction layer 3 of N-type gallium arsenic (GaAs) is formed by liquid phase epitaxial growth. In this process, it is possible to suppress the growth of an internal current constriction layer 3 on the inverse mesa type protrusion 2 by the suitable selection of growth conditions. In the internal current constriction layer 3, a stripe part 4 is formed in parallel to the inverse mesa type protrusion and in the direction of the inverse mesa. The second liquid phase epitaxial growth is performed to form a double hetero-structure. At this time, defects generated in an indium . gallium . arsenic . phosphorus (InGaAsP) active layer 6 concentrate in a defect concentration part 7 corresponding to the upper part of the strip 4. The crystal of the upper part 8 of the inverse mesa type protrusion 2 which acts as an excitation part can be extremely excellent in quality. |
其他摘要 | 目的:通过控制化合物半导体层中缺陷的产生位置,改善激发部分的结晶性能,并提高半导体发光元件的可靠性。组成:在(100)P型镓上。形成反向台面型突起的砷(GaAs)衬底1,然后通过液相外延生长形成N型镓砷(GaAs)的内部电流构造层3。在该工艺中,可以通过适当选择生长条件来抑制反向台面型突起2上的内部电流限制层3的生长。在内部电流限制层3中,条形部分4平行于反向台面型突起并且在反向台面的方向上形成。进行第二液相外延生长以形成双异质结构。这时,铟中产生缺陷。镓。砷。磷(InGaAsP)活性层6集中在与条带4的上部对应的缺陷集中部分7中。作为激励部分的反向台面型突起2的上部8的晶体的质量非常优异。 。 |
申请日期 | 1985-10-24 |
专利号 | JP1987098689A |
专利状态 | 失效 |
申请号 | JP1985238798 |
公开(公告)号 | JP1987098689A |
IPC 分类号 | H01L33/14 | H01L33/30 | H01S5/00 | H01L33/00 | H01S3/18 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/79566 |
专题 | 半导体激光器专利数据库 |
作者单位 | SHARP CORP |
推荐引用方式 GB/T 7714 | HOSODA MASAHIRO,HAYASHI HIROSHI,YAMAMOTO SABURO,et al. Semiconductor light emitting element. JP1987098689A[P]. 1987-05-08. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
JP1987098689A.PDF(177KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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