Xi'an Institute of Optics and Precision Mechanics,CAS
Variable wavelength semiconductor laser | |
其他题名 | Variable wavelength semiconductor laser |
SASAKI TATSUYA; SAKATA YASUTAKA | |
1992-10-05 | |
专利权人 | NEC CORP |
公开日期 | 1992-10-05 |
授权国家 | 日本 |
专利类型 | 发明申请 |
摘要 | PURPOSE:To reduce the occurrence of leakage currents so as to increase the optical output of the title laser and widen the wavelength variable width by inverting a laminated n-type semiconductor contact layer and semiconductor current blocking layer to p-type and bringing an n-type semiconductor base layer into contact with the n-type semiconductor contact layer. CONSTITUTION:InGaP tuning layer 4, n-type InP base layer 5, active layer 6, the first p-type clad layer 7 are formed by selective growth. All of an n-type InGaAsP contact layer 11, p-type current block layer 13, and n-type current block layer 14 which are grown after an SiO2 film is removed are formed of InGaAsP similar to the layer 7 and the layer thickness on the (111) B plane is made extremely thin. In addition, the n-type layers formed on the (111) B plane are inverted to p-type so that the layers do not interfere with a laser driving current 41 flowing to the first clad layer 7. |
其他摘要 | 目的:通过将层叠的n型半导体接触层和半导体电流阻挡层反转为p型并带来n-来减少漏电流的发生,从而增加标题激光器的光输出并扩大波长可变宽度。键入半导体基层与n型半导体接触层接触。组成:InGaP调整层4,n型InP基层5,有源层6,第一p型覆层7通过选择性生长形成。在去除SiO 2膜之后生长的所有n型InGaAsP接触层11,p型电流阻挡层13和n型电流阻挡层14由类似于层7的InGaAsP和层厚度形成。(111)B平面非常薄。另外,在(111)B平面上形成的n型层被反转为p型,使得这些层不会干扰流到第一包层7的激光器驱动电流41。 |
申请日期 | 1991-01-08 |
专利号 | JP1992279078A |
专利状态 | 失效 |
申请号 | JP1991000630 |
公开(公告)号 | JP1992279078A |
IPC 分类号 | H01S5/00 | H01S5/06 | H01S3/103 | H01S3/18 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/79048 |
专题 | 半导体激光器专利数据库 |
作者单位 | NEC CORP |
推荐引用方式 GB/T 7714 | SASAKI TATSUYA,SAKATA YASUTAKA. Variable wavelength semiconductor laser. JP1992279078A[P]. 1992-10-05. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
JP1992279078A.PDF(183KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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