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Semiconductor laser manufacture
其他题名Semiconductor laser manufacture
GEORGE BLAIR SCOTT
1983-05-25
专利权人PHILIPS ELECTRONIC AND ASSOCIATED INDUSTRIES LIMITED
公开日期1983-05-25
授权国家英国
专利类型发明申请
摘要A semiconductor laser which can sustain a high optical power density emission without suffering catastrophic optical damage of the reflective facets adopts the so-called "window structure" i.e. with the active material layer (4) spaced from the reflective facets. To make the laser a first cladding layer (3) is provided on a semiconductor substrate (1) of the same conductivity type. The active region is then grown by molecular beam epitaxy as a discrete island (4) after which a second cladding layer (5) is provided on the upper surface of the semiconductor body to envelope the active region (4). The laser can be completed by providing metallized contacts (6,7). Both cladding layers may also be formed by molecular beam epitaxy.
其他摘要能够维持高光功率密度发射而不遭受反射面的灾难性光学损伤的半导体激光器采用所谓的“窗口结构”,即活性材料层(4)与反射面间隔开。为了制造激光器,在相同导电类型的半导体衬底(1)上提供第一包层(3)。然后通过分子束外延生长有源区作为离散岛(4),之后在半导体本体的上表面上提供第二包层(5)以包围有源区(4)。可以通过提供金属化触点(6,7)来完成激光。两个包层也可以通过分子束外延形成。
主权项A method of manufacturing a semiconductor laser comprising a semiconductor body having an active region between two cladding layers, the material of each cladding layer having a larger bandgap than the material of the active region, which method includes the steps of providing the first cladding layer on a semiconductor substrate, the first layer having the same conductivity type as the substrate, providing the second cladding layer on the first layer, and providing the active region between said first and second cladding layers, said active region having the opposite conductivity type to one or other of the cladding layers, characterized in that the active region is grown by molecular beam epitaxy as a discrete island on the first cladding layer before providing the second cladding layer on the island and on exposed parts of the first cladding layer so that the island is enveloped by said cladding layers.
申请日期1981-10-26
专利号GB2109155A
专利状态失效
申请号GB1981032182
公开(公告)号GB2109155A
IPC 分类号H01S5/16 | H01S5/00 | H01S5/227 | H01L33/00 | H01S3/19
专利代理人-
代理机构-
文献类型专利
条目标识符http://ir.opt.ac.cn/handle/181661/66156
专题半导体激光器专利数据库
作者单位PHILIPS ELECTRONIC AND ASSOCIATED INDUSTRIES LIMITED
推荐引用方式
GB/T 7714
GEORGE BLAIR SCOTT. Semiconductor laser manufacture. GB2109155A[P]. 1983-05-25.
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