Xi'an Institute of Optics and Precision Mechanics,CAS
Stem for semiconductor device | |
其他题名 | Stem for semiconductor device |
KOGURE NAOSHI | |
1990-07-20 | |
专利权人 | NEC CORP |
公开日期 | 1990-07-20 |
授权国家 | 日本 |
专利类型 | 发明申请 |
摘要 | PURPOSE:To increase the electrostatic breakdown strength of a stem by a method wherein a pad for metal wire bonding use is constituted of a double layer consisting of an iron layer, which is the surface of the pad, and a copper layer, which is the lower part of the pad. CONSTITUTION:A copper post 3 is soldered on a stem base 1 made of iron, a heat sink 4, which is made of high-resistance Si and has each conductor layer 9a and 9b on its upper and lower surfaces, is soldered thereon and a semiconductor laser pellet 5 is fixed on this layer 9a. Moreover, an iron layer 7 is provided on part of the surface of the post 3 and a bonding is performed by a gold bonding wire 6b from this layer 7 to a lead 2. Moreover, a bonding is performed by a gold bonding wire 6a from the pellet 5 to the layer 7. As a result, the heat of the pellet 5 passes through the Si heat sink and the copper post and is efficiently dissipated outside of the stem base. In such a way, by covering part of the stem with a metal layer having a large hardness, a wire bonding is facilitated without disturbing the heat dissipation of the pellet and the electrostatic breakdown strength of the stem can be increased. |
其他摘要 | 用途:通过一种方法来增加杆的静电击穿强度,其中用于金属线接合的垫由双层构成,该双层由作为垫的表面的铁层和铜层构成,该铜层是铜层。垫的下半部分。组成:铜柱3焊接在由铁制成的杆座1上,散热器4由高阻Si制成,并在其上下表面上焊接有每个导体层9a和9b,并焊接在其上半导体激光芯块5固定在该层9a上。此外,在柱3的表面的一部分上设置铁层7,并且通过金键合线6b从该层7到引线2进行接合。此外,通过金接合线6a进行接合。颗粒5到达层7.结果,颗粒5的热量通过Si散热器和铜柱,并有效地散发到杆底部之外。以这种方式,通过用具有大硬度的金属层覆盖杆的一部分,在不干扰丸粒的散热的情况下便于引线键合,并且可以增加杆的静电击穿强度。 |
主权项 | - |
申请日期 | 1989-01-12 |
专利号 | JP1990186648A |
专利状态 | 失效 |
申请号 | JP1989006123 |
公开(公告)号 | JP1990186648A |
IPC 分类号 | H01L23/34 | H01L21/60 | H01S5/00 | H01S3/18 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/63197 |
专题 | 半导体激光器专利数据库 |
作者单位 | NEC CORP |
推荐引用方式 GB/T 7714 | KOGURE NAOSHI. Stem for semiconductor device. JP1990186648A[P]. 1990-07-20. |
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