System and method for performing photothermal measurements and relaxation compensation

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	System and method for performing photothermal measurements and relaxation compensation
其他题名	System and method for performing photothermal measurements and relaxation compensation
	ROTTER, LAWRENCE D.; WANG, DAVID Y.; SHAUGHNESSY, DERRICK; SENKO, MARK
	2012-05-09
专利权人	KLA-TENCOR CORPORATION
公开日期	2012-05-09
授权国家	欧洲专利局
专利类型	发明申请
摘要	A device and methods for performing a photothermal measurement and relaxation compensation of a sample are disclosed. The device may include a probe beam source, a pump beam source, a sample, and a detector array. A method may include adjusting an intensity modulated pump beam power, adjusting a probe beam power to increase a response measurement location temperature and increase a modulated optical reflectance signal, directing the intensity modulated pump beam and the probe beam along a measurement path to a response measurement location on a sample for periodically exciting a region on the sample, detecting a reflected portion of the probe beam, and calculating an implantation dose.
其他摘要	公开了一种用于执行样品的光热测量和弛豫补偿的装置和方法。该装置可包括探测光束源，泵浦光束源，样品和检测器阵列。一种方法可以包括调整强度调制泵浦光束功率，调整探测光束功率以增加响应测量位置温度并增加调制光学反射信号，将强度调制泵浦光束和探测光束沿测量路径引导至响应测量在样品上定位，用于周期性地激发样品上的区域，检测探针束的反射部分，以及计算注入剂量。
主权项	A method for evaluating a semiconductor sample during fabrication, comprising: adjusting an intensity modulated pump beam power; adjusting a probe beam power to increase a response measurement location temperature and increase a modulated optical reflectance signal; directing the intensity modulated pump beam and the probe beam along a measurement path to a response measurement location on a sample for periodically exciting a region on the sample; detecting a reflected portion of the probe beam; and calculating an implantation dose by using a detected reflected portion of the probe beam.
申请日期	2010-06-25
专利号	EP2449366A2
专利状态	失效
申请号	EP2010800259
公开（公告）号	EP2449366A2
IPC 分类号	G01N25/72 \| G01N21/63 \| H01L21/66
专利代理人	-
代理机构	LUKASZYK, SZYMON
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/62538
专题	半导体激光器专利数据库
作者单位	KLA-TENCOR CORPORATION
推荐引用方式 GB/T 7714	ROTTER, LAWRENCE D.,WANG, DAVID Y.,SHAUGHNESSY, DERRICK,et al. System and method for performing photothermal measurements and relaxation compensation. EP2449366A2[P]. 2012-05-09.