Line selected F2 two chamber laser system

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	Line selected F2 two chamber laser system
其他题名	Line selected F2 two chamber laser system
	KNOWLES, DAVID S.; BROWN, DANIEL J.,W.; SANDSTROM, RICHARD, L.; RYLOV, GERMAN E.; ONKELS, ECKEHARD, D.; BESAUCELE, HERVE A.; MYERS, DAVID, W.; ERSHOV, ALEXANDER, I.; PARTLO, WILLIAM N.; FOMENKOV, IGOR, V.; UJAZDOWSKI, RICHARD, C.; NESS, RICHARD, M.; SMITH, SCOT, T.; HULBURD, WILLIAM, G.
	2006-04-19
专利权人	CYMER, INC.
公开日期	2006-04-19
授权国家	欧洲专利局
专利类型	发明申请
摘要	A very narrow band two chamber high repetition rate F2 gas discharge laser system comprising. A) a first laser unit comprising: 1) a first discharge chamber containing; a) a first laser gas b) a first pair of elongated spaced apart electrodes defining a first discharge region, 2) a first fan producing sufficient gas movement of said first laser gas in said first discharge region to clear from said first discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a first heat exchanger system removing heat energy from said first laser gas, B) a line selection unit minimizing energy outside of a single selected line spectrum, C) a second laser unit comprising: 1) a second discharge chamber containing: a) a second laser gas, b) a second pair of elongated spaced apart electrodes defining a second discharge region 2) a second fan for producing sufficient gas movement of said second laser gas in said second discharge region to clear from said second discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a second heat exchanger system removing heat energy from said second laser gas, D) a pulse power system configured to provide electrical pulses to said first pair of electrodes and to said second pair of electrodes sufficient to produce laser output pulses at rates of about 4,000 laser output pulses per second with precisely controlled laser output pulse energies in excess of about 5 mJ, E) a laser beam measurement and control system for measuring the laser output pulse energy of laser output pulses produced by said two chamber laser system and controlling said laser output pulses in a feedback control arrangement, and wherein output laser beams from said first laser unit are utilized as a seed beam for seeding said second laser unit.
其他摘要	一种非常窄的带两腔高重复率F2气体放电激光系统包括。 A）第一激光器单元，包括：1）第一放电室，包含; a）第一激光气体b）第一对细长间隔开的电极，限定第一放电区域; 2）第一风扇，在所述第一放电区域产生所述第一激光气体的足够气体运动，以从所述第一放电区域清除，每次气体放电时，基本上所有放电在下一次气体放电之前产生离子，当以每秒4,000次气体放电或更高的重复率操作时，3）第一热交换器系统从所述第一激光气体中去除热能，B c）第二激光器单元，包括：1）第二放电室，其包含：a）第二激光气体，b）第二对细长间隔开的电极，其限定单个选定线谱之外的能量第二排放区域2）第二风扇，用于产生足够的气体运动在所述第二放电区域中的所述第二激光气体从所述第二放电区域清除，在每次气体放电之后，当在每秒4,000次气体放电或更高的重复率下操作时，在下一次气体放电之前基本上所有放电产生的离子3）从所述第二激光气体中去除热能的第二热交换器系统，D）脉冲功率系统，其配置成向所述第一对电极和所述第二对电极提供足以产生激光输出脉冲的电脉冲，其速率为每秒约4,000个激光输出脉冲，精确控制的激光输出脉冲能量超过约5mJ，E）激光束测量和控制系统，用于测量由所述两室激光系统产生的激光输出脉冲的激光输出脉冲能量并控制所述激光输出脉冲在反馈控制装置中，并且其中来自所述第一激光器单元的输出激光束用作se用于播种的第二个激光器单元。
主权项	A very narrow band two chamber high repetition rate F 2 gas discharge laser system comprising: A) a first laser unit comprising: 1) a first discharge chamber containing; a) a first laser gas b) a first pair of elongated spaced apart electrodes defining a first discharge region, 2) a first fan producing sufficient gas movement of said first laser gas in said first discharge region to clear from said first discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a first heat exchanger system removing heat energy from said first laser gas, B) a line selection unit minimizing energy outside of a single selected line spectrum, C) a second laser unit comprising: 1) a second discharge chamber containing: a) a second laser gas, b) a second pair of elongated spaced apart electrodes defining a second discharge region 2) a second fan for producing sufficient gas movement of said second laser gas in said second discharge region to clear from said second discharge region, following each gas discharge, substantially all discharge produced ions prior to a next gas discharge when operating at a repetition rate in the range of 4,000 gas discharges per second or greater, 3) a second heat exchanger system removing heat energy from said second laser gas, D) a pulse power system configured to provide electrical pulses to said first pair of electrodes and to said second pair of electrodes sufficient to produce laser output pulses at rates of about 4,000 laser output pulses per second with precisely controlled laser output pulse energies in excess of about 5 mJ, E) a laser beam measurement and control system for measuring the laser output pulse energy of laser output pulses produced by said two chamber laser system and controlling said laser output pulses in a feedback control arrangement, and wherein output laser beams from said first laser unit are utilized as a seed beam for seeding said second laser unit.
申请日期	2002-08-19
专利号	EP1458066A3
专利状态	失效
申请号	EP2004011567
公开（公告）号	EP1458066A3
IPC 分类号	H01S3/225 \| H01S3/23 \| H01L21/027 \| G01J9/00 \| G03F7/20 \| H01S3/00 \| H01S3/03 \| H01S3/034 \| H01S3/036 \| H01S3/038 \| H01S3/04 \| H01S3/041 \| H01S3/08 \| H01S3/0943 \| H01S3/097 \| H01S3/0971 \| H01S3/0975 \| H01S3/102 \| H01S3/104 \| H01S3/105 \| H01S3/11 \| H01S3/13 \| H01S3/134 \| H01S3/139 \| H01S3/22 \| H01S3/223
专利代理人	-
代理机构	GRÜNECKER, KINKELDEY, STOCKMAIR & SCHWANHÄUSSER ANWALTSSOZIETÄT
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/62482
专题	半导体激光器专利数据库
作者单位	CYMER, INC.
推荐引用方式 GB/T 7714	KNOWLES, DAVID S.,BROWN, DANIEL J.,W.,SANDSTROM, RICHARD, L.,et al. Line selected F2 two chamber laser system. EP1458066A3[P]. 2006-04-19.

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