Beam homogenizer, laser irradiation apparatus and method for manufacturing semiconductor device

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	Beam homogenizer, laser irradiation apparatus and method for manufacturing semiconductor device
其他题名	Beam homogenizer, laser irradiation apparatus and method for manufacturing semiconductor device
	TANAKA, KOICHIRO
	2005-02-10
专利权人	SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
公开日期	2005-02-10
授权国家	美国
专利类型	发明申请
摘要	A cylindrical lens array cannot be manufactured so that each cylindrical lens has the same radius of curvature and the same accuracy in the surface. Therefore, when the laser annealing is performed using the cylindrical lens array, the beam spots divided by the cylindrical lens array cannot be superposed completely in the same surface. As a result, there is a region where the energy is attenuated in the edge portion of the rectangular beam to be formed, and therefore the intensity distribution of the laser beam becomes inhomogeneous. In the present invention, the cylindrical lens array is used in combination with the optical waveguide. After dividing the laser beam in a predetermined direction by the cylindrical lens array, the divided beams are combined, and then the laser beam is incident into the optical waveguide that acts upon the same direction as the predetermined direction. This can correct the variation in the intensity of the laser beam due to the processing inaccuracy of the cylindrical lens array.
其他摘要	不能制造柱面透镜阵列，使得每个柱面透镜在表面上具有相同的曲率半径和相同的精度。因此，当使用柱面透镜阵列进行激光退火时，由柱面透镜阵列分割的光束点不能完全叠加在同一表面上。结果，存在能量在要形成的矩形光束的边缘部分衰减的区域，因此激光束的强度分布变得不均匀。在本发明中，柱面透镜阵列与光波导组合使用。在通过柱面透镜阵列将激光束沿预定方向分开之后，组合分割的光束，然后激光束入射到与预定方向相同的方向上作用的光波导中。这可以校正由于柱面透镜阵列的处理不精确而引起的激光束强度的变化。
主权项	A beam homogenizer comprising: an optical system for dividing and combining a laser beam in a predetermined direction, and an optical waveguide for homogenizing intensity distribution of the laser beam in the predetermined direction.
申请日期	2004-07-08
专利号	US20050031261A1
专利状态	失效
申请号	US10/885635
公开（公告）号	US20050031261A1
IPC 分类号	H01S5/10 \| B23K26/06 \| B23K26/067 \| B23K26/073 \| G02B6/42 \| G02B27/09 \| G03F7/20 \| H01L21/26 \| H01S3/00 \| G02B6/26
专利代理人	-
代理机构	-
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/61112
专题	半导体激光器专利数据库
作者单位	SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
推荐引用方式 GB/T 7714	TANAKA, KOICHIRO. Beam homogenizer, laser irradiation apparatus and method for manufacturing semiconductor device. US20050031261A1[P]. 2005-02-10.