Xi'an Institute of Optics and Precision Mechanics,CAS
Phase-locked array semiconductor laser | |
其他题名 | Phase-locked array semiconductor laser |
TATENO KIMIO; TSUNODA YOSHITO | |
1987-07-01 | |
专利权人 | HITACHI LTD |
公开日期 | 1987-07-01 |
授权国家 | 日本 |
专利类型 | 发明申请 |
摘要 | PURPOSE:To obtain a far-field pattern of single peak by applying thin films which offer phase shift of lambda/2 on every other oscillation edge planes. CONSTITUTION:On an edge plane 4 of phase-locked array laser, thin films 5 which causes phase shift of lambda/2 are applied on every other light emitting points to make a phase 6 of a wave front of a projected beam flat. For example, there is a method in which SiO2 is applied by sputtering and this is easy. The thickness is determined so that an optical path length, i.e. a refractive index multiplied by the thickness becomes equal to lambda/2. If the phase becomes flat by such a method, a far-field pattern 7 of the projected beam becomes what has a single peak. If this is applied to an optical system in a laser beam printer or an optical disc, the beam of extremely high output can be obtained with high efficiency. |
其他摘要 | 目的:通过应用薄膜获得单峰的远场模式,薄膜在每个其他振荡边缘平面上提供λ/ 2的相移。组成:在锁相阵列激光器的边缘平面4上,在每个其他发光点上施加导致λ/ 2相移的薄膜5,以使投影光束的波前的相位6平坦。例如,有一种方法,其中通过溅射施加SiO 2,这很容易。确定厚度使得光程长度,即折射率乘以厚度变得等于λ/ 2。如果通过这种方法相位变平,则投射光束的远场图案7变为具有单个峰值的图案。如果将其应用于激光束打印机或光盘中的光学系统,则可以高效地获得极高输出的光束。 |
主权项 | - |
申请日期 | 1985-12-23 |
专利号 | JP1987147790A |
专利状态 | 失效 |
申请号 | JP1985287729 |
公开(公告)号 | JP1987147790A |
IPC 分类号 | H01S5/00 | G06K15/12 | G11B7/125 | G11B7/127 | H01S3/00 | H01S5/028 | H01S5/40 | H01S3/18 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/59441 |
专题 | 半导体激光器专利数据库 |
作者单位 | HITACHI LTD |
推荐引用方式 GB/T 7714 | TATENO KIMIO,TSUNODA YOSHITO. Phase-locked array semiconductor laser. JP1987147790A[P]. 1987-07-01. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
JP1987147790A.PDF(71KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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