Infrared projector and infrared observation system

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	Infrared projector and infrared observation system
其他题名	Infrared projector and infrared observation system
	TAKAHASHI, KOJI; KAWANISHI, HIDENORI
	2018-03-22
专利权人	SHARP KABUSHIKI KAISHA
公开日期	2018-03-22
授权国家	美国
专利类型	发明申请
摘要	An infrared projector and an infrared observation system by which unevenness of wavelengths in a projection pattern is reduced are provided. An infrared projector (100) is provided with infrared semiconductor laser elements (11a to 11d) that emit near-infrared laser light beams (L1a, L1b, L1c, and L1d), a scattering member (51) that receives and scatters the near-infrared laser light beams, and a projecting member (61) that projects the near-infrared laser light beams scattered by the scattering member.
其他摘要	提供一种红外投影仪和红外观察系统，通过该系统减小投影图案中的波长的不均匀性。红外半导体激光器元件（ 11 ）发射近红外激光束（L 1 ，L 1 ， L b 和L b ），散射构件（ 51 接收并散射近红外激光束的投射构件（ 61 ）投射由散射构件散射的近红外激光束。
主权项	19. An infrared projector, comprising: a plurality of laser light sources that emit near-infrared laser light beams; a scattering member that receives the near-infrared laser light beams emitted from the plurality of laser light sources and scatters the received near-infrared laser light beams; and a projecting member that projects the near-infrared laser light beams scattered by the scattering member, wherein the near-infrared laser light beams are focused in an overlapping manner on a front surface of the scattering member.
申请日期	2016-03-16
专利号	US20180080816A1
专利状态	授权
申请号	US15/564449
公开（公告）号	US20180080816A1
IPC 分类号	G01J1/08 \| G01J1/44 \| G01J1/04 \| G02B5/02 \| G03B15/02 \| F21V8/00 \| G02B7/02 \| G02B7/182 \| G02B27/09 \| H04N5/33
专利代理人	-
代理机构	-
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/59075
专题	半导体激光器专利数据库
作者单位	SHARP KABUSHIKI KAISHA
推荐引用方式 GB/T 7714	TAKAHASHI, KOJI,KAWANISHI, HIDENORI. Infrared projector and infrared observation system. US20180080816A1[P]. 2018-03-22.