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Pseudomorphic layer in tunnel junction VCSEL
其他题名Pseudomorphic layer in tunnel junction VCSEL
RYOU, JAE-HYUN
2005-01-06
专利权人FINISAR CORPORATION
公开日期2005-01-06
授权国家美国
专利类型发明申请
摘要A vertical cavity surface emitting laser (VCSEL) includes an indium-based semiconductor alloy substrate, a first mirror stack over the substrate, an active region having a plurality of quantum wells over the first mirror stack, a tunnel junction over the active region, the tunnel junction including a p-doped pseudomorphically strained layer of a compound selected from the group consisting of Al-rich InAlAs, AlAs, Ga-rich InGaAs, GaAs and combinations thereof, and a second mirror stack over the tunnel junction. The pseudomorphically strained layer can be used to form a tunnel junction with a n-doped layer of InP or AlInAs, or with a lower bandgap material such as AlInGaAs or InGaAsP. Such tunnel junctions are especially useful for a long wavelength VCSEL.
其他摘要垂直腔表面发射激光器(VCSEL)包括铟基半导体合金衬底,衬底上的第一镜堆,在第一镜堆上具有多个量子阱的有源区,在有源区上方的隧道结,隧道结包括选自由富Al的InAlAs,AlAs,富含Ga的InGaAs,GaAs及其组合组成的组的化合物的p掺杂假晶应变层,以及在隧道结上的第二镜堆。假晶应变层可用于与InP或AlInAs的n掺杂层或与诸如AlInGaAs或InGaAsP的较低带隙材料形成隧道结。这种隧道结特别适用于长波长VCSEL。
主权项A vertical cavity surface emitting laser, comprising: an indium-based semiconductor alloy substrate; a first mirror stack over the substrate; an active region having a plurality of quantum wells over the first mirror stack; a tunnel junction over the active region, the tunnel junction including a p-doped pseudomorphically strained layer of a compound selected from the group consisting of Al-rich InAlAs, AlAs, Ga-rich InGaAs, GaAs and combinations thereof; and a second mirror stack over the tunnel junction.
申请日期2003-07-03
专利号US20050002430A1
专利状态失效
申请号US10/611992
公开(公告)号US20050002430A1
IPC 分类号H01S5/042 | H01S5/183 | H01S5/00
专利代理人-
代理机构-
文献类型专利
条目标识符http://ir.opt.ac.cn/handle/181661/56510
专题半导体激光器专利数据库
作者单位FINISAR CORPORATION
推荐引用方式
GB/T 7714
RYOU, JAE-HYUN. Pseudomorphic layer in tunnel junction VCSEL. US20050002430A1[P]. 2005-01-06.
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