Adjustable laser illumination pattern

OPT OpenIR > 半导体激光器专利数据库

	Adjustable laser illumination pattern
其他题名	Adjustable laser illumination pattern
	NEMEYER, ADAM
	2016-07-21
专利权人	STEINER EOPTICS, INC.
公开日期	2016-07-21
授权国家	美国
专利类型	发明申请
摘要	A laser illuminator emitting a circular profile of substantially uniform intensity is presented. The laser illuminator may include a heat sink configured to optically couple to a laser light source. The heat sink may include a beam dump cavity configured to absorb light from the laser light source, and a circularizer aperture having a cylindrical, flat-top opening and being configured to shape a portion of laser light emitted from the laser light source to exit the heat sink. The laser illuminator may also include a collimation lens configured to collect the light exited from the heat sink and provide a focused beam of light, and a scatter clean-up aperture optically coupled to the collimation lens. The scatter clean-up aperture may be configured to absorb scatter laser light rays, and provide from the focused beam of light an output beam of light comprising a circular profile of substantially uniform intensity.
其他摘要	提出了发射基本均匀强度的圆形轮廓的激光照射器。激光照射器可以包括散热器，该散热器被配置为光学耦合到激光光源。散热器可以包括：束流收集腔，被配置为吸收来自激光光源的光;以及圆形化器孔，具有圆柱形平顶开口，并被配置为对从激光光源发射的激光的一部分进行整形以离开散热器。激光照射器还可以包括准直透镜，其配置成收集从散热器射出的光并提供聚焦光束，以及光学耦合到准直透镜的散射清理孔径。散射清理孔可以被配置为吸收散射激光光线，并且从聚焦光束提供包括基本均匀强度的圆形轮廓的输出光束。
主权项	A laser illuminator comprising:a heat sink configured to optically couple to a laser light source, the heat sink comprising: a beam dump cavity configured to absorb light from the laser light source; and a circularizer aperture comprising a cylindrical, flat-top opening, the circularizer aperture configured to shape a portion of laser light emitted from the laser light source to exit the heat sink having a circular profile defined by the cylindrical, flat-top opening; a collimation lens configured to collect the laser light exited from the heat sink and provide from the collected light a focused beam of light; anda scatter clean-up aperture optically coupled to the collimation lens, the scatter clean-up aperture configured to: absorb scatter laser light rays refracted from the focused beam of light; and provide from the focused beam of light an output beam of light comprising a circular profile of substantially uniform intensity.
申请日期	2015-01-16
专利号	US20160208988A1
专利状态	授权
申请号	US14/598772
公开（公告）号	US20160208988A1
IPC 分类号	F21K99/00 \| F21V5/04 \| F21V29/70 \| G02B27/09
专利代理人	-
代理机构	-
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/54557
专题	半导体激光器专利数据库
作者单位	STEINER EOPTICS, INC.
推荐引用方式 GB/T 7714	NEMEYER, ADAM. Adjustable laser illumination pattern. US20160208988A1[P]. 2016-07-21.