Xi'an Institute of Optics and Precision Mechanics,CAS
Semiconductor light-emitting devices | |
其他题名 | Semiconductor light-emitting devices |
SHIMOYAMA, KENJI; HOSOI, NOBUYUKI; FUJII, KATSUSHI; YAMAUCHI, ATSUNORI; GOTOH, HIDEKI; SATO, YOSHIHITO | |
1998-09-22 | |
专利权人 | MITSUBISHI CHEMICAL CORPORATION |
公开日期 | 1998-09-22 |
授权国家 | 美国 |
专利类型 | 授权发明 |
摘要 | The present invention provides a semiconductor light-emitting device including a first clad layer comprising a first conductive type of AlGaAsP compound, a second clad layer that is located next to the first clad layer, comprises a first conductive type of AlGaInP compound and has a thickness of up to 0.5 mu m, an active layer that is located next to the second clad layer and comprises a first or second conductive type AlGaInP or GaInP, a third clad layer that is located next to the active layer, comprises a second conductive type of AlGaInP compound and has a thickness of up to 0.5 mu m, and a fourth clad layer that is located next to the third clad layer and comprises a second conductive type of AlGaAsP compound, and/or a light-extracting layer that comprises a second conductive type AlGaP or GaP and has a thickness of 1 mu m to 100 mu m. |
其他摘要 | 本发明提供一种半导体发光装置,包括:第一包层,包括第一导电类型的AlGaAsP化合物;第二包层,位于第一包层旁边,包括第一导电类型的AlGaInP化合物,并且具有厚度高达0.5微米,有源层位于第二包层旁边并包括第一或第二导电类型AlGaInP或GaInP,第三包层位于有源层旁边,包括第二导电类型AlGaInP化合物,厚度最大为0.5μm,第四包层位于第三包层旁边,包括第二导电类型的AlGaAsP化合物,和/或包含第二导电层的光提取层AlGaP或GaP型,厚度为1μm至100μm。 |
申请日期 | 1995-08-31 |
专利号 | US5811839 |
专利状态 | 失效 |
申请号 | US08/521980 |
公开(公告)号 | US5811839 |
IPC 分类号 | H01L33/00 | H01S5/323 | H01S5/00 | H01S5/32 | H01L33/30 | H01S3/19 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/47485 |
专题 | 半导体激光器专利数据库 |
作者单位 | MITSUBISHI CHEMICAL CORPORATION |
推荐引用方式 GB/T 7714 | SHIMOYAMA, KENJI,HOSOI, NOBUYUKI,FUJII, KATSUSHI,et al. Semiconductor light-emitting devices. US5811839[P]. 1998-09-22. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
US5811839.PDF(99KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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