Xi'an Institute of Optics and Precision Mechanics,CAS
MULTIPLE ANODIZATION SCHEME FOR PRODUCING GaAs LAYERS OF NONUNIFORM THICKNESS | |
其他题名 | MULTIPLE ANODIZATION SCHEME FOR PRODUCING GaAs LAYERS OF NONUNIFORM THICKNESS |
LOGAN, RALPH ANDRE; MILLER, BARRY IRWIN | |
1975-01-07 | |
专利权人 | BELL TELEPHONE LABORATORIES, INCORPORATED |
公开日期 | 1975-01-07 |
授权国家 | 美国 |
专利类型 | 授权发明 |
摘要 | A multiple anodization technique is described for producing GaAs layers of nonuniform thickness; that is, GaAs layers having substantially rectangular steps or grooves of the type capable of guiding light. The technique includes the following steps: (1) growing a native oxide layer on a major surface of the GaAs layer by submersing the GaAs layer in an anodization bath of concentrated H.sub.2 O.sub.2 having a pH less than 6; (2) removing selected portions of the oxide layer so as to expose the GaAs layer adjacent to the desired step region; and (3) immersing the surface again in an anodization bath of concentrated H.sub.2 O.sub.2 having a pH less than 6. Also described are techniques for growing by liquid phase epitaxy an AlGaAs layer over the resultant GaAs step structure in a manner which alleviates two problems: the formation of deleterious oxides on the GaAs layer and the dissolving of the step configuration while in contact with the AlGaAs growth solution. |
其他摘要 | 描述了一种多阳极氧化技术,用于制造厚度不均匀的GaAs层;也就是说,GaAs层具有能够引导光的类型的基本上矩形的台阶或凹槽。该技术包括以下步骤:(1)通过将GaAs层浸没在pH小于6的浓H2O2的阳极氧化浴中,在GaAs层的主表面上生长自然氧化层。 ; (2)去除氧化物层的选定部分,以暴露与所需台阶区相邻的GaAs层; (3)将表面再次浸入pH小于6的浓度H2O2的阳极氧化浴中。还描述了通过液相外延生长AlAsAs层而得到的GaAs步骤结构的技术以减轻两个问题的方式:在GaAs层上形成有害氧化物和在与AlGaAs生长溶液接触时溶解阶梯构型。 |
申请日期 | 1974-01-17 |
专利号 | US3859178 |
专利状态 | 失效 |
申请号 | US05/434286 |
公开(公告)号 | US3859178 |
IPC 分类号 | C25D11/02 | C25D11/32 | H01S5/00 | H01S5/227 | C23B5/48 | C23B5/46 | C23B9/00 |
专利代理人 | - |
代理机构 | URBANO, M. J. |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/47320 |
专题 | 半导体激光器专利数据库 |
作者单位 | BELL TELEPHONE LABORATORIES, INCORPORATED |
推荐引用方式 GB/T 7714 | LOGAN, RALPH ANDRE,MILLER, BARRY IRWIN. MULTIPLE ANODIZATION SCHEME FOR PRODUCING GaAs LAYERS OF NONUNIFORM THICKNESS. US3859178[P]. 1975-01-07. |
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US3859178.PDF(581KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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