Xi'an Institute of Optics and Precision Mechanics,CAS
Semiconductor laser device including highly reflective coating film | |
其他题名 | Semiconductor laser device including highly reflective coating film |
NISHIGUCHI, HARUMI; MATSUOKA, HIROMASU; NAKAGAWA, YASUYUKI; KUNITSUGU, YASUHIRO | |
2010-11-02 | |
专利权人 | MITSUBISHI ELECTRIC CORPORATION |
公开日期 | 2010-11-02 |
授权国家 | 美国 |
专利类型 | 授权发明 |
摘要 | A semiconductor light-emitting device includes a light generation unit generating light with an oscillation wavelength λ, a light outgoing facet from which light generated at the light generation unit emerges, a light reflecting facet at which light generated at the light generation unit is reflected, and a high reflection film at the light reflecting facet and made of a dielectric multilayered film of at least three layers. The high reflection film includes a first layer which is in contact with the light reflection facet, is constituted of Al2O3, and has a thickness smaller than λ/4n, wherein n is the refractive index of Al2O3, a second layer which is in contact with the first layer, and a third layer which is in contact with the second layer and has a refractive index different from the refractive index of the second layer. |
其他摘要 | 一种半导体发光装置,包括产生具有振荡波长λ的光的光产生单元,在光产生单元处产生的光出射的光出射面,在光产生单元处产生的光被反射的光反射面,光反射面上的高反射膜,由至少三层的电介质多层膜构成。高反射膜包括与光反射面接触的第一层,由Al2O3构成,并且具有小于λ/ 4n的厚度,其中n是Al2O3的折射率,第二层是与Al2O3接触的第一层和第三层,第三层与第二层接触并具有与第二层的折射率不同的折射率。 |
主权项 | A semiconductor laser device including semiconductor films on a substrate, comprising: a cavity extending in a propagation direction of a laser beam having wavelength λ; a first facet on a first end of the cavity and through which the laser beam is emitted; a second facet on a second end of the cavity and reflecting the laser beam; anda highly reflective film on said second facet and consisting of an insulating multi-layered film of at least three layers, wherein said highly reflective film comprises a first layer which is in contact with said second facet, is constituted of Al2O3, and has a thickness smaller than λ/4n wherein n is the refractive index of Al2O3, a second layer which is in contact with said first layer and is constituted of any of SiO2, MgF2, NaF, Ca2F, CeF3, LaF3, LiF, and NdF3, and a third layer which is in contact with said second layer and has a refractive index different from the refractive index of said second layer. |
申请日期 | 2008-01-30 |
专利号 | US7826507 |
专利状态 | 失效 |
申请号 | US12/022194 |
公开(公告)号 | US7826507 |
IPC 分类号 | H01S5/00 |
专利代理人 | - |
代理机构 | LEYDIG,VOIT & MAYER,LTD. |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/46280 |
专题 | 半导体激光器专利数据库 |
作者单位 | MITSUBISHI ELECTRIC CORPORATION |
推荐引用方式 GB/T 7714 | NISHIGUCHI, HARUMI,MATSUOKA, HIROMASU,NAKAGAWA, YASUYUKI,et al. Semiconductor laser device including highly reflective coating film. US7826507[P]. 2010-11-02. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
US7826507.PDF(126KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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