Method to control the thickness of an antireflection coating and implementation installation

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	Method to control the thickness of an antireflection coating and implementation installation
其他题名	Method to control the thickness of an antireflection coating and implementation installation
	LANDREAU, JEAN; NAKAJIMA, HISAO
	1991-06-18
专利权人	ETAT FRANCAIS REPRESENTE PAR LE MINISTRE DES POSTES, DES TELECOMMUNICATIONS ET DE L'ESPACE (CENTRE NATIONAL D'ETUDES DES TELECOMMUNICATIONS
公开日期	1991-06-18
授权国家	美国
专利类型	授权发明
摘要	Method to control the thickness of an antireflection coating. According to the invention, the semi-conductive structure (14) is fed with a constant current (16) and the voltage (24) is measured at its terminals. This voltage passes through a maximum when the reflectivity of the antireflection coating passes through a minimum. Application for the embodiment of semi-conductive lasers.
其他摘要	控制抗反射涂层厚度的方法。根据本发明，半导体结构（14）被馈送恒定电流（16）并且在其端子处测量电压（24）。当抗反射涂层的反射率通过最小值时，该电压通过最大值。应用于半导体激光器的实施例。
主权项	Method to control the thickness of an antireflection coating when deposited on one of the faces of a semiconductive laser, wherein the laser is fed with a constant current during depositing, this method being characterized in that the voltage is measured at the laser terminals, the passage of this voltage through a maximum being detected, which indicates that the antireflection coating has a thickness providing it with minimum reflectivity.
申请日期	1990-06-28
专利号	US5024853
专利状态	失效
申请号	US07/544876
公开（公告）号	US5024853
IPC 分类号	G01B11/06 \| H01S5/028 \| H01S5/00 \| C23C14/54
专利代理人	-
代理机构	FINNEGAN,HENDERSON,FARABOW,GARRETT & DUNNER
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/45618
专题	半导体激光器专利数据库
作者单位	ETAT FRANCAIS REPRESENTE PAR LE MINISTRE DES POSTES, DES TELECOMMUNICATIONS ET DE L'ESPACE (CENTRE NATIONAL D'ETUDES DES TELECOMMUNICATIONS
推荐引用方式 GB/T 7714	LANDREAU, JEAN,NAKAJIMA, HISAO. Method to control the thickness of an antireflection coating and implementation installation. US5024853[P]. 1991-06-18.

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