Method for manufacturing an optical device

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	Method for manufacturing an optical device
其他题名	Method for manufacturing an optical device
	PARK, KYUNG-HYUN; KIM, JONG-HOI; BAEK, YONG-SOON; PARK, MOON-HO; KIM, SUNG-BOCK; OH, KWANG-RYONG
	2003-10-28
专利权人	ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
公开日期	2003-10-28
授权国家	美国
专利类型	授权发明
摘要	Disclosed is a method for the fabrication of a spot-size converter with a lateral-tapered waveguide (or an active layer), which utilizes a mask during a lithographic process wherein the mask has a pad that can absorb strain to be occurred during forming a lateral-tapered waveguide pattern at its distal end and the lateral-tapered waveguide is fabricated by forming the distal end on the order of about 0.6 mum in width followed by forming the lateral-tapered waveguide on the order of 0.1 mum using an wet etching. Thus, it is possible to reduce a fabrication cost because it is free from a high-resolution electron beam lithography and a stepper, and hence enhance a reproducibility of the lateral-tapered waveguide because it is free from an excessive wet etching during the use of a contact exposure equipment. Further, it is possible to integrate the spot-size converter fabricated by the above with an optical device, resulting in an increased position adjustment and reproducibility of the spot-size converter, which in turn, leads to increase in yield for the optical device.
其他摘要	公开了一种用于制造具有横向锥形波导（或有源层）的光斑尺寸转换器的方法，其在光刻工艺期间利用掩模，其中掩模具有能够吸收在形成期间发生的应变的衬垫。通过形成宽度约为0.6μm的远端，然后使用湿法蚀刻形成0.1μm量级的横向锥形波导，制造在其远端的横向锥形波导图案和横向锥形波导。因此，可以降低制造成本，因为它没有高分辨率电子束光刻和步进器，因此增强了横向锥形波导的再现性，因为它在使用期间没有过度湿蚀刻。接触式曝光设备。此外，可以将由上述制造的光斑尺寸转换器与光学装置集成，从而增加光斑尺寸转换器的位置调整和再现性，这又导致光学装置的产量增加。
主权项	A method for manufacturing an optical device, comprising the steps of: a) forming a waveguide layer on a semiconductor substrate; b) forming a mask layer and patterning the mask layer into a predetermined configuration in such a way that the predetermined configuration has a taper portion at its both distal ends and a pair of strain distributed pads; c) etching the waveguide layer using the patterned mask layer as an etching mask; and d) removing the patterned mask layer and subsequently removing portions of the waveguide layer corresponding to the strain distributed pads, thereby obtaining a tapered waveguide.
申请日期	2001-08-10
专利号	US6639735
专利状态	失效
申请号	US09/927221
公开（公告）号	US6639735
IPC 分类号	G02B6/12 \| G02B6/122 \| H01S5/00 \| H01S5/10 \| H01S5/20 \| G02B6/02 \| G02B3/08
专利代理人	-
代理机构	BLAKELY,SOKOLOFF,TAYLOR & ZAFMAN
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/44499
专题	半导体激光器专利数据库
作者单位	ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
推荐引用方式 GB/T 7714	PARK, KYUNG-HYUN,KIM, JONG-HOI,BAEK, YONG-SOON,et al. Method for manufacturing an optical device. US6639735[P]. 2003-10-28.

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