Xi'an Institute of Optics and Precision Mechanics,CAS
Method for manufacturing an optical device | |
其他题名 | Method for manufacturing an optical device |
PARK, KYUNG-HYUN; KIM, JONG-HOI; BAEK, YONG-SOON; PARK, MOON-HO; KIM, SUNG-BOCK; OH, KWANG-RYONG | |
2003-10-28 | |
专利权人 | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
公开日期 | 2003-10-28 |
授权国家 | 美国 |
专利类型 | 授权发明 |
摘要 | Disclosed is a method for the fabrication of a spot-size converter with a lateral-tapered waveguide (or an active layer), which utilizes a mask during a lithographic process wherein the mask has a pad that can absorb strain to be occurred during forming a lateral-tapered waveguide pattern at its distal end and the lateral-tapered waveguide is fabricated by forming the distal end on the order of about 0.6 mum in width followed by forming the lateral-tapered waveguide on the order of 0.1 mum using an wet etching. Thus, it is possible to reduce a fabrication cost because it is free from a high-resolution electron beam lithography and a stepper, and hence enhance a reproducibility of the lateral-tapered waveguide because it is free from an excessive wet etching during the use of a contact exposure equipment. Further, it is possible to integrate the spot-size converter fabricated by the above with an optical device, resulting in an increased position adjustment and reproducibility of the spot-size converter, which in turn, leads to increase in yield for the optical device. |
其他摘要 | 公开了一种用于制造具有横向锥形波导(或有源层)的光斑尺寸转换器的方法,其在光刻工艺期间利用掩模,其中掩模具有能够吸收在形成期间发生的应变的衬垫。通过形成宽度约为0.6μm的远端,然后使用湿法蚀刻形成0.1μm量级的横向锥形波导,制造在其远端的横向锥形波导图案和横向锥形波导。因此,可以降低制造成本,因为它没有高分辨率电子束光刻和步进器,因此增强了横向锥形波导的再现性,因为它在使用期间没有过度湿蚀刻。接触式曝光设备。此外,可以将由上述制造的光斑尺寸转换器与光学装置集成,从而增加光斑尺寸转换器的位置调整和再现性,这又导致光学装置的产量增加。 |
主权项 | A method for manufacturing an optical device, comprising the steps of: a) forming a waveguide layer on a semiconductor substrate; b) forming a mask layer and patterning the mask layer into a predetermined configuration in such a way that the predetermined configuration has a taper portion at its both distal ends and a pair of strain distributed pads; c) etching the waveguide layer using the patterned mask layer as an etching mask; and d) removing the patterned mask layer and subsequently removing portions of the waveguide layer corresponding to the strain distributed pads, thereby obtaining a tapered waveguide. |
申请日期 | 2001-08-10 |
专利号 | US6639735 |
专利状态 | 失效 |
申请号 | US09/927221 |
公开(公告)号 | US6639735 |
IPC 分类号 | G02B6/12 | G02B6/122 | H01S5/00 | H01S5/10 | H01S5/20 | G02B6/02 | G02B3/08 |
专利代理人 | - |
代理机构 | BLAKELY,SOKOLOFF,TAYLOR & ZAFMAN |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/44499 |
专题 | 半导体激光器专利数据库 |
作者单位 | ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE |
推荐引用方式 GB/T 7714 | PARK, KYUNG-HYUN,KIM, JONG-HOI,BAEK, YONG-SOON,et al. Method for manufacturing an optical device. US6639735[P]. 2003-10-28. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
US6639735.PDF(1118KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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