Xi'an Institute of Optics and Precision Mechanics,CAS
Sort pulse light source and generating method for short pulse light | |
其他题名 | Sort pulse light source and generating method for short pulse light |
MIYAZAWA TAKEO; NAGANUMA KAZUNORI; IWAMURA HIDETOSHI | |
专利权人 | 日本電信電話株式会社 |
公开日期 | 1992-08-06 |
授权国家 | 日本 |
专利类型 | 发明申请 |
摘要 | PURPOSE:To obtain a light having a shorter pulse width than that of a prior art type semiconductor mode locking laser by strengthening a pulse sharpening operation in a light amplifying region and a saturable absorption region. CONSTITUTION:A light amplifying region 1 is formed in a graded index InGaAs/ InGaAsP quantum well laser structure. The numbers of InGaAs well layers of a quantum well 10 and InGaAsP barrier layers are 12 and 11, a clad layer 11 is made of InP, and the uppermost part of an epitaxial layer is formed of an Inlays cap layer 12. A DC current slightly larger than a threshold value is applied to the above laser structure. A reverse bias is applied to the same laser structure of a saturable absorption region to operate as a saturable absorber. A high frequency current of 16GHz is applied to the region 1 to obtain a pulse having 8GHz of a repetition frequency and 1ps of a width. |
其他摘要 | 目的:通过加强光放大区域和可饱和吸收区域中的脉冲锐化操作,获得脉冲宽度比现有技术类型半导体锁模激光器短的光。组成:光放大区域1形成在渐变折射率InGaAs / InGaAsP量子阱激光器结构中。量子阱10和InGaAsP势垒层的InGaAs阱层的数量是12和11,包层11由InP制成,并且外延层的最上部分由Inlays盖层12形成。稍微的DC电流将大于阈值的值应用于上述激光器结构。将反向偏压施加到可饱和吸收区域的相同激光器结构,以作为可饱和吸收器操作。将16GHz的高频电流施加到区域1以获得具有8GHz重复频率和1ps宽度的脉冲。 |
申请日期 | 1990-12-14 |
专利号 | JP1992215489A |
专利状态 | 失效 |
申请号 | JP1990402399 |
公开(公告)号 | JP1992215489A |
IPC 分类号 | H01S5/00 | H01S5/042 | H01S3/096 | H01S3/18 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/44077 |
专题 | 半导体激光器专利数据库 |
作者单位 | 日本電信電話株式会社 |
推荐引用方式 GB/T 7714 | MIYAZAWA TAKEO,NAGANUMA KAZUNORI,IWAMURA HIDETOSHI. Sort pulse light source and generating method for short pulse light. JP1992215489A. |
条目包含的文件 | 条目无相关文件。 |
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