Xi'an Institute of Optics and Precision Mechanics,CAS
Optical semiconductor device having active layer of p-type quantum dot structure and its manufacture method | |
其他题名 | Optical semiconductor device having active layer of p-type quantum dot structure and its manufacture method |
HATORI, NOBUAKI; YAMAMOTO, TSUYOSHI; SUDO, HISAO; ARAKAWA, YASUHIKO | |
2012-07-31 | |
专利权人 | FUJITSU LIMITED |
公开日期 | 2012-07-31 |
授权国家 | 美国 |
专利类型 | 授权发明 |
摘要 | An active layer having a p-type quantum dot structure is disposed over a lower cladding layer made of semiconductor material of a first conductivity type. An upper cladding layer is disposed over the active layer. The upper cladding layer is made of semiconductor material, and includes a ridge portion and a cover portion. The ridge portion extends in one direction, and the cover portion covers the surface on both sides of the ridge portion. A capacitance reducing region is disposed on both sides of the ridge portion and reaching at least the lower surface of the cover portion. The capacitance reducing region has the first conductivity type or a higher resistivity than that of the ridge portion, and the ridge portion has a second conductivity type. If the lower cladding layer is an n-type, the capacitance reducing region reaches at least the upper surface of the lower cladding layer. |
其他摘要 | 具有p型量子点结构的有源层设置在由第一导电类型的半导体材料制成的下包层上。上包层设置在有源层上。上包覆层由半导体材料制成,并包括脊部和覆盖部。脊部沿一个方向延伸,并且盖部覆盖脊部两侧的表面。电容减小区域设置在脊部分的两侧并且至少到达覆盖部分的下表面。电容减小区域具有第一导电类型或比脊部分的电阻率高的电阻率,并且脊部分具有第二导电类型。如果下包层是n型,则电容减小区域至少到达下包层的上表面。 |
授权日期 | 2012-07-31 |
申请日期 | 2009-06-18 |
专利号 | US8232125 |
专利状态 | 授权 |
申请号 | US12/457677 |
公开(公告)号 | US8232125 |
IPC 分类号 | H01L21/00 | B82Y20/00 | H01S5/22 | H01S5/343 |
专利代理人 | - |
代理机构 | KRATZ,QUINTOS & HANSON,LLP |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/38499 |
专题 | 半导体激光器专利数据库 |
作者单位 | FUJITSU LIMITED |
推荐引用方式 GB/T 7714 | HATORI, NOBUAKI,YAMAMOTO, TSUYOSHI,SUDO, HISAO,et al. Optical semiconductor device having active layer of p-type quantum dot structure and its manufacture method. US8232125[P]. 2012-07-31. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
US8232125.PDF(201KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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