Chemical etching mechanisms and crater morphologies pre-irradiated by temporally decreasing pulse trains of femtosecond laser | |
Du, Kun1; Jiang, Lan1; Li, Xiaowei1; Zhang, Hao1; Wang, Andong1; Yao, Zhulin1; Pan, Changji1; Wang, Zhi1; Li, Ming2; Grigoropoulos, Costas P.3; Lu, Yongfeng4 | |
作者部门 | 瞬态光学技术国家重点实验室 |
2019-03-01 | |
发表期刊 | Applied Surface Science |
ISSN | 01694332 |
卷号 | 469页码:44-49 |
产权排序 | 2 |
摘要 | We report the influence of temporally decreasing pulse trains on femtosecond laser-induced chemical etching (FLICE) of fused silica. A systematic comparison of the unshaped pulse and decreasing pulse trains of femtosecond laser for FLICE was conducted, and the differences were interpreted using a plasma model. The results revealed that the decreasing pulse trains not only affected the etching efficiency but also affected the morphology of the etched crater. When an etched crater was pre-irradiated by decreasing pulse trains, it presented a funnel-like shape at the early stage of the etching process, which contrasted with the one pre-irradiated by unshaped pulse. At the later stage of the etching process, the funnel-like shape gradually disappeared, and the crater increased in size. Compared with the unshaped pulse under the same processing conditions, the decreasing pulse trains enhanced the etched crater volume by approximately 18 times. Theoretical calculations based on the plasma model indicated that the free-electron density generated using the unshaped pulse was much higher than that generated by the decreasing pulse trains in skin layer of the sample during the first few hundred femtoseconds. The high free-electron density increased the reflectivity in skin layer of the sample; thus, the tail part of the incident pulse was strongly reflected. Consequently, the laser energy deposition into the fused silica sample decreased, eventually led to a low etching efficiency. © 2018 |
DOI | 10.1016/j.apsusc.2018.10.272 |
收录类别 | EI |
语种 | 英语 |
出版者 | Elsevier B.V. |
EI入藏号 | 20184506049935 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/30713 |
专题 | 瞬态光学研究室 |
通讯作者 | Jiang, Lan |
作者单位 | 1.Laser Micro/Nano Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing; 100081, China; 2.State Key Laboratory of Transient Optics and Photonics, Xi'an Institute of Optics and Precision Mechanics of CAS, Xi'an; 710119, China; 3.Laser Thermal Laboratory, Department of Mechanical Engineering, University of California, 6129 Etcheverry Hall, Berkeley; CA; 94720-1740, United States; 4.Department of Electrical Engineering, University of Nebraska-Lincoln, Lincoln; NE; 68588-0511, United States |
推荐引用方式 GB/T 7714 | Du, Kun,Jiang, Lan,Li, Xiaowei,et al. Chemical etching mechanisms and crater morphologies pre-irradiated by temporally decreasing pulse trains of femtosecond laser[J]. Applied Surface Science,2019,469:44-49. |
APA | Du, Kun.,Jiang, Lan.,Li, Xiaowei.,Zhang, Hao.,Wang, Andong.,...&Lu, Yongfeng.(2019).Chemical etching mechanisms and crater morphologies pre-irradiated by temporally decreasing pulse trains of femtosecond laser.Applied Surface Science,469,44-49. |
MLA | Du, Kun,et al."Chemical etching mechanisms and crater morphologies pre-irradiated by temporally decreasing pulse trains of femtosecond laser".Applied Surface Science 469(2019):44-49. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
Chemical etching mec(1509KB) | 期刊论文 | 出版稿 | 限制开放 | CC BY-NC-SA | 请求全文 |
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