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Laser spectral engineering for lithographic process 专利
专利类型: 授权发明, 专利号: US7382815, 申请日期: 2008-06-03, 公开日期: 2008-06-03
发明人:  SPANGLER, RONALD L.;  LIPCON, JACOB P.;  RULE, JOHN A.;  JACQUES, ROBERT N.;  KROYAN, ARMEN;  LALOVIC, IVAN;  FOMENKOV, IGOR V.;  ALGOTS, JOHN M.
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Line selected F2 two chamber laser system 专利
专利类型: 发明申请, 专利号: EP1458066A3, 申请日期: 2006-04-19, 公开日期: 2006-04-19
发明人:  KNOWLES, DAVID S.;  BROWN, DANIEL J.,W.;  SANDSTROM, RICHARD, L.;  RYLOV, GERMAN E.;  ONKELS, ECKEHARD, D.;  BESAUCELE, HERVE A.;  MYERS, DAVID, W.;  ERSHOV, ALEXANDER, I.;  PARTLO, WILLIAM N.;  FOMENKOV, IGOR, V.;  UJAZDOWSKI, RICHARD, C.;  NESS, RICHARD, M.;  SMITH, SCOT, T.;  HULBURD, WILLIAM, G.
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