Plasma Properties of 532 nm Laser-Ablated Aluminum E414d Target with Direrent Power Densities

doi:10.1088/1009-0630/12/4/01

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	Plasma Properties of 532 nm Laser-Ablated Aluminum E414d Target with Direrent Power Densities
	Luo Wenfeng; Sun Qibing; Gao Cunxiao; Tang Jie; Wang Haojing; Zhao Wei
作者部门	瞬态光学国家重点实验室
	2010-08-01
发表期刊	PLASMA SCIENCE & TECHNOLOGY
ISSN	1009-0630
卷号	12 期号:4 页码:385-390
摘要	Optical emission spectra of the plasma generated by a 532 nm Nd:YAG laser irradiation onto a standard aluminum alloy (E414d) was recorded and analyzed. The electron temperature was determined using the Boltzmann plot method with three aluminum spectral lines at 236.71 nm, 257.509 nm and 308.215 nm, where as the electron density was inferred by measuring the Stark broadening line profile of Al(II) 281.619 nm. The experimental results confirmed that the local thermodynamic equilibrium was valid and the plasma was optically thin. The spectral line intensity increased initially with the increase in laser irradiance and saturated at higher ir-radiance levels. Results showed that the energy losses due to the reflection of laser beam from the plasma itself were insignificant. The absorption in the plasma through inverse bremsstrahlung and two-photon ionization were studied. At the same time, the variation of transition probability ratio of Al(I) 309.28 nm to Al(I) 308.21 nm with laser power density was also studied.
文章类型	Article
关键词	Libs Plasma Emission Spectroscopy
WOS标题词	Science & Technology ; Physical Sciences
DOI	10.1088/1009-0630/12/4/01
收录类别	SCI ; EI
关键词[WOS]	SPECTROMETRY ; DIAGNOSTICS ; PRESSURE ; SILICON ; ALLOYS ; LIBS ; ZINC
语种	英语
WOS研究方向	Physics
WOS类目	Physics, Fluids & Plasmas
WOS记录号	WOS:000281989500001
引用统计	被引频次：8[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.opt.ac.cn/handle/181661/9837
专题	瞬态光学研究室
作者单位	Chinese Acad Sci, Xian Inst Opt & Precis Mech, State Key Lab Transient Opt & Photon, Xian 710119, Peoples R China
推荐引用方式 GB/T 7714	Luo Wenfeng,Sun Qibing,Gao Cunxiao,et al. Plasma Properties of 532 nm Laser-Ablated Aluminum E414d Target with Direrent Power Densities[J]. PLASMA SCIENCE & TECHNOLOGY,2010,12(4):385-390.
APA	Luo Wenfeng,Sun Qibing,Gao Cunxiao,Tang Jie,Wang Haojing,&Zhao Wei.(2010).Plasma Properties of 532 nm Laser-Ablated Aluminum E414d Target with Direrent Power Densities.PLASMA SCIENCE & TECHNOLOGY,12(4),385-390.
MLA	Luo Wenfeng,et al."Plasma Properties of 532 nm Laser-Ablated Aluminum E414d Target with Direrent Power Densities".PLASMA SCIENCE & TECHNOLOGY 12.4(2010):385-390.

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