Xi'an Institute of Optics and Precision Mechanics,CAS
A Bioinspired Skin UV Filter with Broadband UV Protection, Photostability, and Resistance to Oxidative Damage | |
Li, Nini1,2; Ji, Xiaohong1; Mukherjee, Somnath1; Yang, Bing1; Ren, Yuqing1; Wang, Changhao1; Chen, Yashao1 | |
作者部门 | 先进光学元件试制中心 |
2023-03-01 | |
发表期刊 | ACS Applied Materials and Interfaces |
ISSN | 19448244;19448252 |
卷号 | 15期号:8页码:10383-10397 |
产权排序 | 1 |
摘要 | In recent years, sunscreens’ adverse impacts on the environment and biology have gained wide attention. The improvement of sunscreen safety has become one of the major priorities in skin photoprotection research. It is an effective strategy to develop bionic photoprotective materials by simulating the photoprotective mechanism existing in nature. Inspired by the photoprotective mechanisms of skin and plant leaves, the bionic photoprotective material CS-SA-PDA nanosheet was developed using the free radical grafting method and Michael addition, with natural melanin analogue polydopamine (PDA) nanoparticles and plant sunscreen molecular sinapic acid (SA) as sun protection factors and natural polymer chitosan (CS) as the connecting arm. The results show that CS-SA-PDA can effectively shield UVB and UVA due to the possible synergistic effect between PDA and SA. The introduction of polymer CS significantly improved the photostability of SA and reduced the skin permeability of PDA nanoparticles. The CS-SA-PDA nanosheet can also effectively scavenge photoinduced free radicals. Furthermore, in vivo toxicity and anti-UV evaluations confirm that CS-SA-PDA has no skin irritation and is excellent against skin photodamage, which makes it an ideal skin photoprotective material. © 2023 American Chemical Society. |
关键词 | bioinspired skin photoprotective materials polydopamine sinapic acid photostability scavenging free radicals |
DOI | 10.1021/acsami.2c19773 |
收录类别 | SCI ; EI |
语种 | 英语 |
WOS记录号 | WOS:000934138000001 |
出版者 | American Chemical Society |
EI入藏号 | 20230913638894 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/96369 |
专题 | 先进光学元件试制中心 |
通讯作者 | Wang, Changhao; Chen, Yashao |
作者单位 | 1.Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education, School of Chemistry & Chemical Engineering, Shaanxi Normal University, Xi’an; 710119, China 2.State Key Laboratory of Transient Optics and Photonics, Xi’an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi’an; 710119, China |
推荐引用方式 GB/T 7714 | Li, Nini,Ji, Xiaohong,Mukherjee, Somnath,et al. A Bioinspired Skin UV Filter with Broadband UV Protection, Photostability, and Resistance to Oxidative Damage[J]. ACS Applied Materials and Interfaces,2023,15(8):10383-10397. |
APA | Li, Nini.,Ji, Xiaohong.,Mukherjee, Somnath.,Yang, Bing.,Ren, Yuqing.,...&Chen, Yashao.(2023).A Bioinspired Skin UV Filter with Broadband UV Protection, Photostability, and Resistance to Oxidative Damage.ACS Applied Materials and Interfaces,15(8),10383-10397. |
MLA | Li, Nini,et al."A Bioinspired Skin UV Filter with Broadband UV Protection, Photostability, and Resistance to Oxidative Damage".ACS Applied Materials and Interfaces 15.8(2023):10383-10397. |
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1678952617671.pdf(13066KB) | 期刊论文 | 作者接受稿 | 开放获取 | CC BY-NC-SA | 浏览 请求全文 |
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