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Investigation on secondary electron emission characteristics of double-layer structures
Wang, Dan1; He, Yongning1; Guo, Junjiang2,3,4; Cai, Yahui1; Mao, Zhangsong1; Ye, Ming1
作者部门特种光纤材料及器件研究中心
2021-03-07
发表期刊Journal of Applied Physics
ISSN00218979;10897550
卷号129期号:9
产权排序2
摘要

Secondary electron (SE) emission (SEE) from material surfaces is a frequent phenomenon in space and vacuum environments. SEE modulation is important since it governs the performance of some devices such as electronic multipliers or induces some detrimental effects such as multipactors. Surface coating has been reported to modulate SEE effectively, whereas SEE behaviors of coating structures are not clearly understood yet, and the appropriate theory to describe SEE characteristics quantitatively for coating structures is less developed so far. Here, we have prepared four alumina coatings possessing various thicknesses to research the SEE characteristics of coating structures and have shown how the coating thickness affects the SEE behaviors. Besides, by considering coating/substrate as an ideal double-layer structure, we have derived several equations to describe the producing, transmitting, and escaping processes of excited inner SEs and finally constructed a unidimensional SEE model for double-layer structures. The model is applicable to reveal the dependence of trueSE yield (TSEY) on the top and bottom layers' physical properties and estimate TSEY proportions contributed by the top and bottom layers at random energy points. By employing the concept, SEE characteristics of Al2O3/Si, MgO/Si, and TiO2/Si double-layer structureshave been quantitatively interpreted. Moreover, the abnormal SEY curve with a double-hump shape, which is induced by the peak position distinction of SiO2/Si structures, can also be explained. This work is of great significance to comprehend TSEY modulating regularities of various double-layer structures applied in surface engineering. © 2021 Author(s).

DOI10.1063/5.0023325
收录类别SCI ; EI
语种英语
WOS记录号WOS:000630435000001
出版者American Institute of Physics Inc.
EI入藏号20211110075432
引用统计
被引频次:8[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.opt.ac.cn/handle/181661/94572
专题光子功能材料与器件研究室
通讯作者He, Yongning
作者单位1.School of Microelectronics, Xian Jiaotong University, Xian; 710049, China;
2.State Key Laboratory of Transient Optics and Photonics, Xian Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xian; 710119, China;
3.Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Shaanxi Key Lab of Information Photonic Technique, School of Electronics and Information Engineering, Xian Jiaotong University, Xian; 710049, China;
4.University of Chinese Academy of Sciences (UCAS), Beijing; 100049, China
推荐引用方式
GB/T 7714
Wang, Dan,He, Yongning,Guo, Junjiang,et al. Investigation on secondary electron emission characteristics of double-layer structures[J]. Journal of Applied Physics,2021,129(9).
APA Wang, Dan,He, Yongning,Guo, Junjiang,Cai, Yahui,Mao, Zhangsong,&Ye, Ming.(2021).Investigation on secondary electron emission characteristics of double-layer structures.Journal of Applied Physics,129(9).
MLA Wang, Dan,et al."Investigation on secondary electron emission characteristics of double-layer structures".Journal of Applied Physics 129.9(2021).
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