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Sub-aperture optical system testing by using of a modified simulateous fit method
Kewei, E.; Zhao, Jianke; Wang, Tao; Wang, Zhengfeng; Liu, Kai; Chang, Ming; Zhou, Yan
2020
会议名称2020 Applied Optics and Photonics China: Optics Ultra Precision Manufacturing and Testing, AOPC 2020
会议录名称AOPC 2020: Optics Ultra Precision Manufacturing and Testing
卷号11568
会议日期2020-06-29
会议地点Shanghai, China
出版者SPIE
产权排序1
摘要

Sub-aperture stitching interferometry can be used for measurement of wavefront of large aperture optical system. A variety of sub-aperture stitching algorithms have been studied to reconstruct the sub-aperture data to obtain full aperture wavefront. The simultaneous fitting method plays an important role among those stitching algorithms which uses a series of global polynomials to accomplish the fitting of the test wavefronts, however, it can only be applied in the case of there have no overlap between each sub-apertures. Therefore, a modified simultaneous fitting method is proposed and is applied to measure the wavefront of large aperture optical system. The proposed algorithm is applicable whether there exists overlap between each sub-aperture or not. The numerical simulation is carried out to evaluate the accuracy of the algorithm. Further, a practical stitching experiment that test an optical system with a diameter of 850mm was implemented to demonstrate the modified algorithm. © 2020 SPIE. All rights reserved.

关键词wavefront testing sub-aperture stitching large aperture optical system simultaneous fit
作者部门检测技术研究中心
DOI10.1117/12.2579949
收录类别EI ; CPCI
ISBN号9781510639577
语种英语
ISSN号0277786X;1996756X
WOS记录号WOS:000616198900047
EI入藏号20204909580551
引用统计
文献类型会议论文
条目标识符http://ir.opt.ac.cn/handle/181661/94436
专题检测技术研究中心
通讯作者Kewei, E.
作者单位Xi'an Institute of Optics and Precision Mechanics, Chinese Academy of Sciences, Xi'an; 10119, China
推荐引用方式
GB/T 7714
Kewei, E.,Zhao, Jianke,Wang, Tao,et al. Sub-aperture optical system testing by using of a modified simulateous fit method[C]:SPIE,2020.
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