Formation of diffraction grating

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	Formation of diffraction grating
其他题名	Formation of diffraction grating
	SUGIMOTO HIROSHI; MATSUI TERUHITO; OTSUKA KENICHI; ABE YUJI; OISHI TOSHIYUKI
	1989-01-06
专利权人	三菱電機株式会社
公开日期	1989-01-06
授权国家	日本
专利类型	发明申请
摘要	PURPOSE:To form simply a diffraction grating in antiphase to a resist shape on a substrate by forming a coating film layer on a diffraction grating layer formed of a resin without causing damage on the diffraction grating layer, forming a mask of an antiphase diffraction grating after removing a part on the diffraction grating, and etching a substrate using the mask. CONSTITUTION:A diffraction grating of a resist 2 comprising a resin material patterned on a substrate 1 is obtd. when a photosensitive resist comprising the resin material is subjected to interference fringes exposure and developed. In this case, when the process is carried out by the electron cyclotron resonance plasma CVD process, an SiNx layer 3 is formed on the resist 2 at low temp. without causing damage on the resist 2. The layer 3 on the resist 2 is removed by etching with buffer hydrofluoric acid utilizing the difference of etching speed. When the resist 2 is removed, a diffraction grating being in antiphase to the resist 2 by the effect of the layer 3 is formed. When this diffraction grating is used as mask, a diffraction grating being in antiphase to a resist shape is formed simply on the substrate
其他摘要	用途：通过在由树脂形成的衍射光栅层上形成涂膜层而不会对衍射光栅层造成损坏，在基板上形成反射形成反射形状的衍射光栅，形成反相衍射光栅的掩模。去除衍射光栅上的一部分，并使用掩模蚀刻衬底。组成：包括在基板1上图案化的树脂材料的抗蚀剂2的衍射光栅。当包含树脂材料的光敏抗蚀剂经受干涉条纹曝光并显影时。在这种情况下，当通过电子回旋共振等离子体CVD工艺执行该工艺时，在低温下在抗蚀剂2上形成SiNx层3。在不对抗蚀剂2造成损伤的情况下，利用蚀刻速度的差异，通过用缓冲氢氟酸进行蚀刻来去除抗蚀剂2上的层3。当去除抗蚀剂2时，形成通过层3的作用与抗蚀剂2反相的衍射光栅。当该衍射光栅用作掩模时，在基板1上简单地形成与抗蚀剂形状反相的衍射光栅。
申请日期	1987-06-24
专利号	JP1989002008A
专利状态	失效
申请号	JP1987158280
公开（公告）号	JP1989002008A
IPC 分类号	H01L21/205 \| G02B5/18 \| G02B6/122 \| G02B6/124 \| H01L21/302 \| H01S5/00 \| G02B6/12 \| H01S3/18
专利代理人	-
代理机构	-
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/88437
专题	半导体激光器专利数据库
作者单位	三菱電機株式会社
推荐引用方式 GB/T 7714	SUGIMOTO HIROSHI,MATSUI TERUHITO,OTSUKA KENICHI,et al. Formation of diffraction grating. JP1989002008A[P]. 1989-01-06.

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