Xi'an Institute of Optics and Precision Mechanics,CAS
Semiconductor light emitting element | |
其他题名 | Semiconductor light emitting element |
KINOSHITA JIYUNICHI; UEMATSU YUTAKA | |
1983-03-14 | |
专利权人 | TOKYO SHIBAURA DENKI KK |
公开日期 | 1983-03-14 |
授权国家 | 日本 |
专利类型 | 发明申请 |
摘要 | PURPOSE:To attain a current stricture with good efficiency, decrease the controllability of a crystal growth and allow a high output operation, by processing a semi-insulating substrate. CONSTITUTION:A groove is provided on the plane (100) of an Fe doped semi- insulating InP substrate 1 in the direction (011) by using a mask constituted of an Si dioxide film, etc. and formed by a reactive etchant then resulting in the section in a pit shape. Next, an N type InP layer 2, an InGaAsP active layer 3, a P type InP layer 4 and a P type InGaAsP layer 5 to obtain a good ohmic characteristics are successively formed on the semi-insulating InP substrate 1'. Since an active layer 3 becomes crescent at the groove part, it has also a lateral directional light wave guiding function due to the variation of the refractive index. The semi-insulating substrate 1' is thinned from the surface opposite to the crystal growing plane. An N type and P type electrodes are respectively formed on both surfaces of this wafer by an evaporation and a heat treatment. The current stricture is performed with good efficiency by the semi-insulating part 1', the conduction of a stricture layer does not happen, and then a high output can be attained. |
其他摘要 | 目的:通过加工半绝缘基板,以高效率获得电流限制,降低晶体生长的可控性并实现高输出操作。组成:通过使用由二氧化硅薄膜等构成的掩模,在方向(011)的Fe掺杂的半绝缘InP衬底1的平面(100)上提供凹槽,并由反应性蚀刻剂形成,然后导致坑形的部分。接着,在半绝缘InP衬底1'上依次形成N型InP层2,InGaAsP有源层3,P型InP层4和P +型InGaAsP层5,以获得良好的欧姆特性。由于有源层3在沟槽部分变为新月形,因此由于折射率的变化,它还具有横向定向光波导引功能。半绝缘衬底1'从与晶体生长平面相对的表面变薄。通过蒸发和热处理在该晶片的两个表面上分别形成N型和P型电极。通过半绝缘部分1'以高效率执行电流狭窄,不会发生狭窄层的传导,然后可以获得高输出。 |
申请日期 | 1981-09-10 |
专利号 | JP1983043592A |
专利状态 | 失效 |
申请号 | JP1981141747 |
公开(公告)号 | JP1983043592A |
IPC 分类号 | H01L33/14 | H01L33/24 | H01L33/30 | H01L33/36 | H01S5/00 | H01S5/223 | H01L33/00 | H01S3/18 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/85141 |
专题 | 半导体激光器专利数据库 |
作者单位 | TOKYO SHIBAURA DENKI KK |
推荐引用方式 GB/T 7714 | KINOSHITA JIYUNICHI,UEMATSU YUTAKA. Semiconductor light emitting element. JP1983043592A[P]. 1983-03-14. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
JP1983043592A.PDF(150KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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