OPT OpenIR  > 半导体激光器专利数据库
Semiconductor device
其他题名Semiconductor device
FUJITA SHIGEO; FUJITA SHIZUO; IMAIZUMI MASAYUKI; MORISHITA YOSHITAKA; OTSUKA KENICHI
1992-01-14
专利权人MITSUBISHI ELECTRIC CORP
公开日期1992-01-14
授权国家日本
专利类型发明申请
摘要PURPOSE:To obtain a semiconductor device which emits light in a blue color at high efficiency and with good visibility by using a specific semiconductor which is lattice-matched with a substrate. CONSTITUTION:A ZnCdSSe-based mixed-crystal semiconductor epitaxial layer 24 constituted of ZnS, ZnSe, CdS and CdSe which can be easily lattice-matched to a substrate is laminated on a III-V compound semiconductor single-crystal substrate When an n-type ZnSdSse epitaxial layer 21 and a p-type ZnCdSSe epitaxial layer 23 are composed of, e.g. Zn0.4Cd0.6S and a ZnCdSSe lightemitting layer 22 is composed of Zn0.8Cd0.2S0.4Se0.6, the epitaxial layers are lattice-matched with the GaAs single-crystal substrate; the forbidden band width of the n-type ZnCdSSe epitaxial layer 21 and the p-type ZnCdSSe epitaxial layer 23 is at about 2.9eV and that of the ZnCdSSe light-emitting layer 22 is at about 2.6eV. When a voltage is applied across electrodes 31 and 32 in such a way that the electrode 31 on the substrate side is negative, carriers are injected into a light- emitting region with good efficiency, and light is emitted with high efficiency by the recombination of electrons with holes.
其他摘要目的:通过使用与基板晶格匹配的特定半导体,获得一种高效发射蓝光并具有良好可见度的半导体器件。组成:由ZnS,ZnSe,CdS和CdSe构成的ZnCdSSe基混晶半导体外延层24,它可以很容易地与基板晶格匹配,层叠在III-V族化合物半导体单晶衬底1上。型ZnSdSse外延层21和p型ZnCdSSe外延层23由例如Zn0.4Cd0.6S和ZnCdSSe发光层22由Zn0.8Cd0.2S0.4Se0.6构成,外延层与GaAs单晶衬底晶格匹配; n型ZnCdSSe外延层21和p型ZnCdSSe外延层23的禁带宽度约为2.9eV,ZnCdSSe发光层22的禁带宽度约为2.6eV。当以使得基板侧上的电极31为负的方式跨电极31和32施加电压时,载流子以高效率注入发光区域,并且通过电子的复合以高效率发射光。有洞。
申请日期1990-04-27
专利号JP1992010669A
专利状态失效
申请号JP1990113647
公开(公告)号JP1992010669A
IPC 分类号H01L31/10 | H01L33/06 | H01L33/28 | H01L33/30 | H01L33/34 | H01S5/00 | H01L33/00
专利代理人-
代理机构-
文献类型专利
条目标识符http://ir.opt.ac.cn/handle/181661/80451
专题半导体激光器专利数据库
作者单位MITSUBISHI ELECTRIC CORP
推荐引用方式
GB/T 7714
FUJITA SHIGEO,FUJITA SHIZUO,IMAIZUMI MASAYUKI,et al. Semiconductor device. JP1992010669A[P]. 1992-01-14.
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可
JP1992010669A.PDF(224KB)专利 开放获取CC BY-NC-SA请求全文
个性服务
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
谷歌学术
谷歌学术中相似的文章
[FUJITA SHIGEO]的文章
[FUJITA SHIZUO]的文章
[IMAIZUMI MASAYUKI]的文章
百度学术
百度学术中相似的文章
[FUJITA SHIGEO]的文章
[FUJITA SHIZUO]的文章
[IMAIZUMI MASAYUKI]的文章
必应学术
必应学术中相似的文章
[FUJITA SHIGEO]的文章
[FUJITA SHIZUO]的文章
[IMAIZUMI MASAYUKI]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。