Xi'an Institute of Optics and Precision Mechanics,CAS
Semiconductor laser device | |
其他题名 | Semiconductor laser device |
HAMADA TAKESHI; WADA MASARU; ITOU KUNIO; SHIMIZU YUUICHI; KUME MASAHIRO | |
1985-12-19 | |
专利权人 | MATSUSHITA DENKI SANGYO KK |
公开日期 | 1985-12-19 |
授权国家 | 日本 |
专利类型 | 发明申请 |
摘要 | PURPOSE:To reduce optical absorption in the vicinity of the end surfaces of ridges, and to realize a high output by forming each layer containing an active layer onto a substrate to which two parallel ridges, width thereof is narrowed only in sections in the vicinity of the end surfaces, are formed. CONSTITUTION:The width of ridges 1a, 1b is formed in 5mum within 10mum from end surfaces and in 20mum in sections except the end surfaces. The height of the ridges 1a, 1b is shaped in 5mum, and the width of a groove between the ridges 1a, 1b is formed in 4mum. A first layer N type clad layer 2 is grown in 0.2mum in a flat section at the center, a second layer non-doped active layer 3 in approximately 0.05mum at the same position, a third layer P type clad layer 4 in approximately 5mum at the same position and a fourth layer N type cap layer 5 in thickness of approximately 0.5mum continuously on the substrate 1 through a liquid phase epitaxial method. Consequently, the film thickness dB of the active layer in the vicinity of the end surfaces of a laser chip is made thinner than that dA in the vicinity of the center, and the forbidden band width of the active layer is increased only near the end surfaces. Accordingly, since laser beams generated in the inside do not receive absorption near the end surfaces, the laser chip is difficult to be broken in the end surfaces, and extremely large optical outputs can be obtained. |
其他摘要 | 用途:减少脊的端面附近的光学吸收,并通过将包含有源层的每层形成到基板上来实现高输出,基板上有两个平行的脊,其宽度仅在附近的部分中变窄。形成端面。组成:脊1a,1b的宽度在距离端面10mum内5mum内形成,在端面除20mum外形成。脊1a,1b的高度形状为5μm,脊1a,1b之间的槽的宽度形成为4μm。第一层N型包覆层2在中心处的平坦部分中以0.2μm生长,在相同位置处以约0.05μm的面积生长第二层非掺杂有源层3,在约5中以第三层P型包覆层4生长。通过液相外延法在基板1上连续地在相同位置处和第四层N型盖层5,其厚度约为0.5μm。因此,激光器芯片的端面附近的有源层的膜厚度dB比中心附近的dA薄,并且有源层的禁带宽度仅在端面附近增加。 。因此,由于在内部产生的激光束不会在端面附近受到吸收,因此激光芯片难以在端面破裂,并且可以获得极大的光输出。 |
申请日期 | 1984-06-04 |
专利号 | JP1985257583A |
专利状态 | 失效 |
申请号 | JP1984113180 |
公开(公告)号 | JP1985257583A |
IPC 分类号 | H01S5/00 | H01S5/16 | H01S5/223 | H01S3/18 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/78358 |
专题 | 半导体激光器专利数据库 |
作者单位 | MATSUSHITA DENKI SANGYO KK |
推荐引用方式 GB/T 7714 | HAMADA TAKESHI,WADA MASARU,ITOU KUNIO,et al. Semiconductor laser device. JP1985257583A[P]. 1985-12-19. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
JP1985257583A.PDF(188KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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