Reflector, surface emitting laser, method for manufacturing reflector, and method for manufacturing surface emitting laser

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	Reflector, surface emitting laser, method for manufacturing reflector, and method for manufacturing surface emitting laser
其他题名	Reflector, surface emitting laser, method for manufacturing reflector, and method for manufacturing surface emitting laser
	KAWASHIMA, TAKESHI; SATO, SHUNICHI; KAMINISHI, MORIMASA; IWATA, HIROKAZU
	2019-09-05
专利权人	RICOH COMPANY, LTD.
公开日期	2019-09-05
授权国家	美国
专利类型	发明申请
摘要	A reflector includes a low refractive index layer and a high refractive index layer. The low refractive index layer has a first average refractive index and has a laminated structure in which an AlN layer and a GaN layer are alternately laminated. The high refractive index layer has a second average refractive index higher than the first average refractive index and includes an InGaN layer.
其他摘要	反射器包括低折射率层和高折射率层。低折射率层具有第一平均折射率并且具有层叠结构，其中AlN层和GaN层交替层叠。高折射率层具有高于第一平均折射率的第二平均折射率并且包括InGaN层。
主权项	A reflector comprising: a low refractive index layer having a first average refractive index and having a laminated structure in which an AlN layer and a GaN layer are alternately laminated; and a high refractive index layer having a second average refractive index higher than the first average refractive index and including an InGaN layer.
申请日期	2019-02-27
专利号	US20190273360A1
专利状态	申请中
申请号	US16/287541
公开（公告）号	US20190273360A1
IPC 分类号	H01S5/183 \| H01S5/22 \| H01S5/024 \| H01S5/343 \| H01S5/42 \| G03B21/20 \| F21S41/16 \| F21S41/176
专利代理人	-
代理机构	-
文献类型	专利
条目标识符	http://ir.opt.ac.cn/handle/181661/62414
专题	半导体激光器专利数据库
作者单位	RICOH COMPANY, LTD.
推荐引用方式 GB/T 7714	KAWASHIMA, TAKESHI,SATO, SHUNICHI,KAMINISHI, MORIMASA,et al. Reflector, surface emitting laser, method for manufacturing reflector, and method for manufacturing surface emitting laser. US20190273360A1[P]. 2019-09-05.