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Material systems for long wavelength lasers grown on GaSb or InAs substrates
其他题名Material systems for long wavelength lasers grown on GaSb or InAs substrates
BURAK, DARIUSZ
2004-11-02
专利权人AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
公开日期2004-11-02
授权国家美国
专利类型授权发明
摘要A vertical cavity surface emitting laser (VCSEL) capable of producing long-wavelength light has a substrate of GaSb or InAs, and an active region with alternating quantum wells and barrier layers. The target wavelength range is preferably between 2-4 um. The quantum well is made of GaInSbP, GaInSbAs, AlInSbAs, or AlInSbP, and the barrier layers are made of AlInSbP, AlGaSbP, AlInSbAs, AlGaSbAs, or AlSbPAs. The active region is sandwiched between two mirror stacks that are preferably epitaxially grown Distributed Bragg Reflectors. The active region has large conduction and valence band offsets (DeltaEc and DeltaEv) for effective carrier containment over the wide range of ambient temperatures in which the VCSEL is expected to function. The active region can be designed to have little or no lattice strain on the substrate.
其他摘要能够产生长波长光的垂直腔表面发射激光器(VCSEL)具有GaSb或InAs衬底,以及具有交替量子阱和阻挡层的有源区。目标波长范围优选在2-4μm之间。量子阱由GaInSbP,GaInSbAs,AlInSbAs或AlInSbP制成,势垒层由AlInSbP,AlGaSbP,AlInSbAs,AlGaSbAs或AlSbPAs制成。有源区夹在两个镜堆之间,这两个镜堆最好是外延生长的分布式布拉格反射器。有源区具有大的导带和价带偏移(DeltaEc和DeltaEv),用于在预期VCSEL起作用的宽范围的环境温度下有效载流子限制。可以将有源区设计成在衬底上具有很少或没有晶格应变。
主权项A laser device comprising: a substrate; a first and second mirror stack, the first mirror stack position proximate to the substrate; a first and second cladding layer, interposing the first and second mirror stack; and an active region, interposing the first and second cladding layer, the active region having at least one quantum well having a first and second face, the first face adjacent to a first barrier layer and the second face adjacent to a second barrier layer, wherein (a) the quantum well includes material selected from the group consisting of Ga.sub.x In.sub.1-x Sb.sub.y P.sub.1-y, Al.sub.x In.sub.1-x Sb.sub.y As.sub.1-y, Ga.sub.x In.sub.1-x Sb.sub.y As.sub.1-y, and Al.sub.x In.sub.1-x Sb.sub.y P.sub.1-y, where x and y have values ranging from 0 to 1; and (b) each of the first and second barrier layers include material selected from the group consisting of Al.sub.s In.sub.1-s Sb.sub.t P.sub.1-t, Al.sub.s Ga.sub.1-s Sb.sub.t P.sub.1-t, Al.sub.s In.sub.1-s Sb.sub.t As.sub.1-t, Al.sub.s Ga.sub.1-s Sb.sub.t As.sub.1-t, and AlSb.sub.s P.sub.t As.sub.1-s-t, where s and t have values ranging from 0 to
申请日期2002-07-16
专利号US6813297
专利状态失效
申请号US10/196872
公开(公告)号US6813297
IPC 分类号H01S5/323 | H01S5/00 | H01S5/183 | H01S5/343
专利代理人-
代理机构SHIE, JUDY I.
文献类型专利
条目标识符http://ir.opt.ac.cn/handle/181661/46625
专题半导体激光器专利数据库
作者单位AVAGO TECHNOLOGIES GENERAL IP (SINGAPORE) PTE. LTD.
推荐引用方式
GB/T 7714
BURAK, DARIUSZ. Material systems for long wavelength lasers grown on GaSb or InAs substrates. US6813297[P]. 2004-11-02.
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