Xi'an Institute of Optics and Precision Mechanics,CAS
Method of fabricating a distributed Bragg reflector having enhanced thermal and electrical properties | |
其他题名 | Method of fabricating a distributed Bragg reflector having enhanced thermal and electrical properties |
COLDREN, LARRY A.; ALMUNEAU, GUILHEM | |
2003-10-07 | |
专利权人 | REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE |
公开日期 | 2003-10-07 |
授权国家 | 美国 |
专利类型 | 授权发明 |
摘要 | A distributed Bragg reflector (DBR) for a vertical cavity surface emitting laser (VCSEL) includes alternating layers of different semiconductor materials to improve thermal and electrical characteristics for the VCSEL. Use of particular materials reduces the thermal resistivity of the DBR and allows heat to dissipate quickly during operation of the VCSEL. |
其他摘要 | 用于垂直腔表面发射激光器(VCSEL)的分布式布拉格反射器(DBR)包括不同半导体材料的交替层,以改善VCSEL的热和电特性。使用特定材料降低了DBR的热阻,并允许热量在VCSEL操作期间快速消散。 |
主权项 | A method of enhancing thermal properties of a distributed Bragg reflector, comprising: growing a high refractive index layer including aluminum gallium arsenic antimonide (AlGaAsSb) on a substrate; and growing a low refractive index layer including indium phosphide (InP) on the substrate, the high refractive index layer being lattice-matched to the low refractive index layer to form a layered semiconductor material, wherein use of InP reduces thermal resistivity in the layered semiconductor material. |
申请日期 | 2001-08-21 |
专利号 | US6631154 |
专利状态 | 失效 |
申请号 | US09/935000 |
公开(公告)号 | US6631154 |
IPC 分类号 | H01S5/183 | H01S5/00 | H01S5/30 | H01S5/323 | H01S5/343 | H01S5/024 | H01S5/042 | H01S5/187 | H01L21/20 |
专利代理人 | - |
代理机构 | - |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/46503 |
专题 | 半导体激光器专利数据库 |
作者单位 | REGENTS OF THE UNIVERSITY OF CALIFORNIA, THE |
推荐引用方式 GB/T 7714 | COLDREN, LARRY A.,ALMUNEAU, GUILHEM. Method of fabricating a distributed Bragg reflector having enhanced thermal and electrical properties. US6631154[P]. 2003-10-07. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
US6631154.PDF(984KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论