Xi'an Institute of Optics and Precision Mechanics,CAS
Process for producing a matrix of "all optical" vertically-structured quantum well components | |
其他题名 | Process for producing a matrix of "all optical" vertically-structured quantum well components |
NISSIM, YVES; BENSOUSSAN, MARCEL; OUDAR, JEAN-LOUIS; RAO, ELCHURI | |
1998-02-03 | |
专利权人 | FRANCE TELECOM |
公开日期 | 1998-02-03 |
授权国家 | 美国 |
专利类型 | 授权发明 |
摘要 | This invention relates to a process for producing a matrix of "all optical" vertically-structured quantum well components. This process consists in the encapsulation of a half-structure constituted by a lower mirror (2) and an active zone (3) partially covered by a self-alignment mask (4) with a negative dielectric layer (7) whose thickness is given by the Bragg condition at the working wavelength. The encapsulated half-structure is thermally treated to induce an alloy interdiffusion (9) in the non-covered parts of the active zone, and covered with one or several negative and positive layers (10,11) so as to complete the upper Bragg mirror. |
其他摘要 | 本发明涉及制备“全光学”垂直结构量子阱组分基质的方法。该过程包括由下部镜子(2)和由自对准掩模(4)部分覆盖的有源区域(3)构成的半结构的封装,其中负性介电层(7)的厚度由下式给出:工作波长下的布拉格条件。对封装的半结构进行热处理,以在有源区的未覆盖部分中诱导合金相互扩散(9),并覆盖一个或多个负极层和正极层(10,11),以完成上部布拉格反射镜。 |
授权日期 | 1998-02-03 |
申请日期 | 1995-06-22 |
专利号 | US5714403 |
专利状态 | 失效 |
申请号 | US08/492951 |
公开(公告)号 | US5714403 |
IPC 分类号 | G02F3/02 | G02F3/00 | G02F1/017 | G02F1/01 | G02F1/21 | G02F1/35 | H01S3/10 | H01S5/00 | H01L21/20 |
专利代理人 | - |
代理机构 | BLAKELY SOKOLOFF TAYLOR & ZAFMAN |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/42369 |
专题 | 半导体激光器专利数据库 |
作者单位 | FRANCE TELECOM |
推荐引用方式 GB/T 7714 | NISSIM, YVES,BENSOUSSAN, MARCEL,OUDAR, JEAN-LOUIS,et al. Process for producing a matrix of "all optical" vertically-structured quantum well components. US5714403[P]. 1998-02-03. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
US5714403.PDF(239KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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