Xi'an Institute of Optics and Precision Mechanics,CAS
Nitride semiconductor light emitting device, method of manufacturing nitride semiconductor light emitting device, and nitride semiconductor transistor device | |
其他题名 | Nitride semiconductor light emitting device, method of manufacturing nitride semiconductor light emitting device, and nitride semiconductor transistor device |
KAMIKAWA, TAKESHI; KAWAGUCHI, YOSHINOBU | |
2011-11-29 | |
专利权人 | SHARP KABUSHIKI KAISHA |
公开日期 | 2011-11-29 |
授权国家 | 美国 |
专利类型 | 授权发明 |
摘要 | Provided are a nitride semiconductor light emitting device including a coat film formed at a light emitting portion and including an aluminum nitride crystal or an aluminum oxynitride crystal, and a method of manufacturing the nitride semiconductor light emitting device. Also provided is a nitride semiconductor transistor device including a nitride semiconductor layer and a gate insulating film which is in contact with the nitride semiconductor layer and includes an aluminium nitride crystal or an aluminum oxynitride crystal. |
其他摘要 | 本发明提供一种氮化物半导体发光器件,其包括在发光部分处形成并包括氮化铝晶体或氮氧化铝晶体的涂层膜,以及制造该氮化物半导体发光器件的方法。还提供了一种氮化物半导体晶体管器件,包括氮化物半导体层和与氮化物半导体层接触并包括氮化铝晶体或氮氧化铝晶体的栅极绝缘膜。 |
授权日期 | 2011-11-29 |
申请日期 | 2008-06-23 |
专利号 | US8067255 |
专利状态 | 授权 |
申请号 | US12/213686 |
公开(公告)号 | US8067255 |
IPC 分类号 | H01L21/00 | H01L21/336 | H01L21/338 | H01L29/778 | H01L29/78 | H01L29/812 | H01S5/028 | H01S5/343 |
专利代理人 | - |
代理机构 | HARNESS,DICKEY & PIERCE,P.L.C. |
文献类型 | 专利 |
条目标识符 | http://ir.opt.ac.cn/handle/181661/38465 |
专题 | 半导体激光器专利数据库 |
作者单位 | SHARP KABUSHIKI KAISHA |
推荐引用方式 GB/T 7714 | KAMIKAWA, TAKESHI,KAWAGUCHI, YOSHINOBU. Nitride semiconductor light emitting device, method of manufacturing nitride semiconductor light emitting device, and nitride semiconductor transistor device. US8067255[P]. 2011-11-29. |
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | ||
US8067255.PDF(282KB) | 专利 | 开放获取 | CC BY-NC-SA | 请求全文 |
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