光谱成像技术研究室知识库

In this paper, a new type of micro imprint lithography assisted by electrostatic field was introduced, and an in-depth theoretical research was conducted on its technological process. First, numerical simulation software (COMSOLTMMultiphysics) was adopted to establish a transient simulation model for electrostatic filed assisted imprint lithography and discussed the evolution process of micro structure in different time domains. Then a detailed analysis was conducted on the qualitative relationship between the micro structure formation and simulation experiment parameters, during which it was found that properly reducing the polar plate spacing, template bulging period and increasing the bulging height, initial polymer film thickness and voltage were beneficial to formation of the micro-nano structure. Finally, a spherical cap micro structure with 31 μm hollow structure was obtained through optimization of the simulation experiment parameters. Compared with traditional imprint method, the electrostatic field assisted micro imprint, which is characterized by simple process and lower cost, can be widely applied to the micro electronic and mechanical system, photonics, genetics and tissue system etc. © 2017, Science Press. All right reserved.