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Measurement of excited layer thickness in highly photo-excited GaAs
Liang, Lingliang1,2,3; Tian, Jinshou1; Wang, Tao1; Wu, Shengli3; Li, Fuli1; Gao, Guilong1,2,3; Liang, Lingliang (lianglingliang@opt.cn)
2016
会议名称International Symposium on Optical Measurement Technology and Instrumentation
会议录名称Optical Measurement Technology and Instrumentation
卷号10155
会议日期2016-05-09
会议地点Beijing, China
出版者SPIE
产权排序1
摘要

Highly photo-excited layer thickness in GaAs is measured using a pump probe arrangement. A normally incident pump illumination spatially modulated by a mask will induce a corresponding refractive index change distribution in the depth direction due to edge scattering and attenuation absorption effect, which can deflect the probe beam passing through this excited region. Maximum deflection of the probe beam will be limited by the thickness of excited layer, and thus can also be employed to measure the thickness of the photo-excited layer of the material. Theoretical calculation confirms the experimental results. This method can find its application in measurements of photo-excited layer thickness of many kinds of materials and be significant to study the characteristics of materials in laser machining, grating and waveguide fabricating. © 2016 SPIE.

关键词Gallium Arsenide Optical Data Processing Optical Variables Measurement Probes Semiconducting Gallium
学科领域Single Element Semiconducting Materials
作者部门精密物理量测量实验室
DOI10.1117/12.2246652
收录类别EI ; ISTP
ISBN号9781510607682
语种英语
ISSN号0277786X
引用统计
文献类型会议论文
条目标识符http://ir.opt.ac.cn/handle/181661/28593
专题条纹相机工程中心
通讯作者Liang, Lingliang (lianglingliang@opt.cn)
作者单位1.Xi'an Institute of Optics and Precision Mechanics of Chinese Academy of Science, State Key Laboratory of Transient Optics and Photonics, No.17 Xinxi Road, Xi'an; 710119, China
2.Graduate University of Chinese, Academy of Sciences, No.19 Yuquan Road, Beijing; 100049, China
3.Xi'an Jiaotong University, No.28 Xianning Road, Xi'an; 710049, China
推荐引用方式
GB/T 7714
Liang, Lingliang,Tian, Jinshou,Wang, Tao,et al. Measurement of excited layer thickness in highly photo-excited GaAs[C]:SPIE,2016.
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